Semiconductor device and manufacturing method thereof

ABSTRACT

A vertical super junction MOSFET and a lateral MOSFET are integrated on the same semiconductor substrate. The lateral MOSFET is electrically isolated from the vertical super junction MOSFET by an n-buried isolating layer and an n-diffused isolating layer. The lateral MOSFET is formed of a p-well region formed in an n −  semiconductor layer bounded by the n-buried isolating layer and n-diffused isolating layer, an n-source region and n-drain region formed in the p-well region, and a gate electrode that covers a portion of the p-well region sandwiched by the n-source region and n-drain region. As the n-buried isolating layer is formed at the same time as an n-layer (3) of the vertical super junction MOSFET, it is possible to reduce cost. Also, it is possible to suppress parasitic action between the elements with the n-buried isolating layer.

BACKGROUND OF THE INVENTION

A. Field of the Invention

The present invention relates to a semiconductor device, and to amanufacturing method thereof.

B. Description of the Related Art

A vertical semiconductor element is such that current flows between anelectrode provided on one main surface of a semiconductor substrate andan electrode provided on the main surface (the other main surface) onthe side of the semiconductor substrate opposite to the one mainsurface. Because of this, in order to maintain a high breakdown voltagein the vertical semiconductor element, it is necessary to increase thethickness of a high resistance semiconductor layer existing between theelectrodes. However, by increasing the thickness of the high resistancesemiconductor layer existing between the electrodes, the on-stateresistance increases. That is, there is a trade-off relationship betweenbreakdown voltage and on-state resistance.

A semiconductor element with a super junction structure, wherein apn-junction (a parallel pn-layer) in which an n-layer and a p-layer arerepeatedly alternately disposed is formed in a drift layer, has beenproposed as a way of improving the trade-off. The parallel pn-layercauses current to flow through the n-layer in an on-state, andwithstands the breakdown voltage in an off-state by depleting then-layer and p-layer. As a semiconductor element with a super junctionstructure is such that it is possible to increase the impurityconcentration of the drift layer, it is possible to reduce the on-stateresistance while maintaining a high breakdown voltage.

A method whereby embedding into a trench formed by selectively etching asemiconductor substrate is carried out by epitaxial growth has beenproposed as a method of manufacturing a semiconductor element with asuper junction structure. Also, a method whereby p-type and n-typeburied regions cyclically formed in a depth direction by continuouslycarrying out ion implantation and epitaxial growth are thermallydiffused and connected has been proposed as a simple method, withimproved mass productivity, of manufacturing a semiconductor elementwith a super junction structure (for example, refer to Japanese PatentNo. 3,988,262).

Reducing the on-state resistance by employing a super junction structurein a vertical semiconductor element is one means of increasing the addedvalue of the vertical semiconductor element. Meanwhile, a semiconductorelement called an intelligent switching device, wherein a lateralsemiconductor element or some kind of passive element is formed on thesame semiconductor substrate as the vertical semiconductor element, hasbeen proposed as another means of increasing the added value of thevertical semiconductor element.

Heretofore, a drive circuit, control circuit, protection circuit, andthe like, of a vertical semiconductor element used in an output stagehave been configured of external, discrete parts. As opposed to this, anintelligent switching device is such that these circuits are configuredof a lateral semiconductor element and various kinds of passive elementformed on the same semiconductor substrate as the vertical semiconductorelement used in the output stage.

In this way, an intelligent switching device is such that each kind ofcircuit element is formed on the same semiconductor substrate as thevertical semiconductor element used in the output stage, without usingexternal, discrete parts. Because of this, it is possible to realize theheretofore known functions at a reduced size and lower cost. Elementisolating technology whereby each element is electrically isolated isincluded as important technology for realizing an intelligent switchingdevice.

When forming a plurality of semiconductor elements on the samesemiconductor substrate, as in an intelligent switching device, elementisolating technology is used in order not to cause a parasitic actionbetween elements. For example, dielectric isolating technology,pn-junction isolating technology, self-isolating technology, and thelike, are commonly known as element isolating technologies.

FIG. 31 is a sectional view showing a configuration of a main portion ofa heretofore known intelligent switching device using dielectricisolating technology. As shown in FIG. 31, the heretofore knownintelligent switching device using dielectric isolating technology issuch that a vertical semiconductor element 511 and a lateralsemiconductor element 512 are formed on an n⁻ epitaxial layer 504. Thelateral semiconductor element 512 configures a drive circuit, a controlcircuit, and a protection circuit.

The vertical semiconductor element 511 and lateral semiconductor element512 are isolated from each other by a silicon oxide film 502, a trenchisolating region 505 in which a silicon oxide film is embedded, and ahigh concentration n⁺ buried region 503, formed on an n⁺ substrate 501.The silicon oxide film 502 and high concentration n⁺ buried region 503are formed between the n⁺ substrate 501 and n⁻ epitaxial layer 504. Thetrench isolating region 505 penetrates the n⁻ epitaxial layer 504 andhigh concentration n⁺ buried region 503, reaching the silicon oxide film502. Element 509 is a p-well region of the vertical semiconductorelement 511.

FIG. 32 is a sectional view showing a configuration of a main portion ofa heretofore known intelligent switching device using pn-junctionisolating technology. As shown in FIG. 32, the heretofore knownintelligent switching device using pn-junction isolating technology issuch that, in the same way as the intelligent switching device usingdielectric isolating technology shown in FIG. 31, the verticalsemiconductor element 511 and lateral semiconductor element 512 areintegrated on the same substrate.

The vertical semiconductor element 511 and lateral semiconductor element512 are isolated from each other by a p⁻ layer 507 and highconcentration p⁺ region 508 formed on the n⁺ substrate 501. The p⁻ layer507 is formed between the n⁺ substrate 501 and n⁻ epitaxial layer 504.The high concentration p⁺ region 508 penetrates the n⁻ epitaxial layer504, coming into contact with the p⁻ layer 507. Element 510 is a buriedn⁺ region that penetrates the p⁻ layer 507, coming into contact with then⁻ epitaxial layer 504 and n⁺ substrate 501.

FIG. 33 is a sectional view showing a configuration of a main portion ofa heretofore known intelligent switching device using self-isolatingtechnology. As shown in FIG. 33, the heretofore known intelligentswitching device using self-isolating technology is such that, unlikethe heretofore known intelligent switching device using pn-junctionisolating technology shown in FIG. 32, the p⁻ layer 507 and highconcentration p⁺ region 508 are not provided. The separation of thevertical semiconductor element 511 and lateral semiconductor element 512is done by increasing the gap between the elements. In FIG. 33, only amain portion of the element cross-sectional structure is shown, and thefact that the gap between the elements is greater than in theintelligent switching device shown in FIG. 32 is omitted from thedrawing.

By configuring an intelligent switching device using the heretoforedescribed element isolating technology in this way, there is realized anintelligent switching device wherein parasitic action between elementsformed on the same semiconductor substrate is suppressed, andmalfunction and breakage is prevented.

Also, a semiconductor element such that the trade-off between on-stateresistance and breakdown voltage is improved using a super junctionstructure is described in Japanese Patent No. 3,988,262. Also, asemiconductor element configured of a super junction structure, and inwhich the cell pitch at which the n-layer and p-layer of the superjunction structure are repeated is reduced, is described inJP-A-2007-012858.

Also, a lateral MOSFET such that low on-state resistance and highbreakdown voltage are balanced using a multi-resurf structure isdescribed in JP-A-2000-286417. The multi-resurf structure can be seen asa super junction structure. That is, the description in JP-A-2000-286417is of a semiconductor device such that a high breakdown voltage lateralsemiconductor element using a super junction structure and a lateralsemiconductor element configuring a control circuit IC bounded by anisolating structure are formed on the same semiconductor substrate.

The present invention is directed to overcoming or at least reducing theeffects of one or more of the problems set forth above.

SUMMARY OF THE INVENTION

As heretofore described, the description has given as examples twomeans—devising a super junction structure and devising an intelligentswitching device—as means of increasing the added value of a verticalsemiconductor element. Also, not being limited to the intelligentswitching devices shown in FIGS. 31 to 33, there have been a largenumber of proposals relating to the element structure, and manufacturingmethod thereof, of the two means.

However, for example, in Japanese Patent No. 3,988,262 andJP-A-2007-012858, there is no mention of using a vertical semiconductorelement with a super junction structure in the output stage, andintegrating a lateral semiconductor element for various kinds of circuit(for example, a control integrated circuit, and the like) on the samesemiconductor substrate as the super junction structure verticalsemiconductor element. Also, in JP-A-2000-286417, there is no mention ofintegrating a lateral semiconductor element on the same semiconductorsubstrate as a super junction structure vertical semiconductor element.

The invention, in order to eliminate the problems with the heretoforedescribed heretofore known technology, provides a semiconductor device,and manufacturing method thereof, such that it is possible to suppressparasitic action between elements formed on the same semiconductorsubstrate. Also, the invention, in order to eliminate the problems withthe heretofore described heretofore known technology, provides asemiconductor device, and manufacturing method thereof, such that it ispossible to reduce cost.

In order to solve the heretofore described problems, a semiconductordevice according to the invention is a semiconductor device having afirst region in which a vertical semiconductor element is disposed and asecond region in which a lateral semiconductor element electricallyisolated from the vertical semiconductor element by an isolatingstructure is disposed, and has the following characteristics. Thesemiconductor device includes a first conductivity type firstsemiconductor layer, and a first conductivity type second semiconductorlayer with an impurity concentration lower than that of the firstsemiconductor layer is provided on a surface of the first semiconductorlayer. Further, a parallel pn-layer formed by a first conductivity typethird semiconductor layer with an impurity concentration higher thanthat of the second semiconductor layer and a second conductivity typefourth semiconductor layer with an impurity concentration higher thanthat of the second semiconductor layer being alternately disposed in ahorizontal direction with respect to a main surface of the secondsemiconductor layer is provided in the first region of the secondsemiconductor layer. Also, the isolating structure including a buriedisolating layer having an impurity concentration the same as that of thethird semiconductor layer or fourth semiconductor layer is provided inthe second region of the second semiconductor layer.

Also, the semiconductor device according to the invention is such that,in the heretofore described aspect of the invention, the thirdsemiconductor layer is a diffusion layer selectively provided in thesecond semiconductor layer. The fourth semiconductor layer is adiffusion layer selectively provided in the third semiconductor layer.The isolating structure is a diffusion layer having an impurityconcentration the same as that of the third semiconductor layer orfourth semiconductor layer.

Also, the semiconductor device according to the invention is such that,in the heretofore described aspect of the invention, the thirdsemiconductor layer and fourth semiconductor layer are diffusion layersselectively provided in the second semiconductor layer. The isolatingstructure is a diffusion layer having an impurity concentration the sameas that of the third semiconductor layer or fourth semiconductor layer.

Also, the semiconductor device according to the invention is such that,in the heretofore described aspect of the invention, the thirdsemiconductor layer and isolating structure are formed of the sameepitaxial layer. The fourth semiconductor layer is a diffusion layer,selectively provided in the third semiconductor layer, with an impurityconcentration higher than that of the third semiconductor layer.

Also, the semiconductor device according to the invention ischaracterized in that, in the heretofore described aspect of theinvention, the vertical semiconductor element is an insulated gate fieldeffect transistor having a planar gate structure or trench gatestructure.

Also, the semiconductor device according to the invention ischaracterized in that, in the heretofore described aspect of theinvention, an edge termination structure of the vertical super junctionMOS transistor is provided on the outer side of the first region so asto surround the first region.

Also, in order to solve the heretofore described problems, asemiconductor device manufacturing method according to the invention isa method of manufacturing a semiconductor device having a first regionin which a vertical semiconductor element is disposed and a secondregion in which a lateral semiconductor element electrically isolatedfrom the vertical semiconductor element by an isolating structure isdisposed, and has the following characteristics. Firstly, a first stepof forming by epitaxial growth on a first semiconductor layer a firstconductivity type first epitaxial layer with an impurity concentrationlower than that of the first semiconductor layer, and a first ionimplantation of a first conductivity type impurity throughout the wholeof the first region of the first epitaxial layer (a second step) arecarried out. Next, a second ion implantation of a second conductivitytype impurity is selectively carried out into the first region of thefirst epitaxial layer into which the first ion implantation has beencarried out (a third step). Next, after the third step, a firstconductivity type second epitaxial layer having an impurityconcentration the same as that of the first epitaxial layer is formed byepitaxial growth on the first epitaxial layer (a fourth step). Next, athird ion implantation of a first conductivity type impurity is carriedout into a region of the second epitaxial layer directly above a placeof the first ion implantation and into the second region distanced fromthe region directly above the place of the first ion implantation (afifth step). Next, after the fifth step, a fourth ion implantation of asecond conductivity type impurity is selectively carried out into aregion of the second epitaxial layer directly above a place of thesecond ion implantation (a sixth step). Next, after the sixth step, afirst conductivity type third epitaxial layer having an impurityconcentration the same as that of the second epitaxial layer is formedby epitaxial growth on the second epitaxial layer (a seventh step).Next, the first conductivity type impurity and second conductivity typeimpurity ion implanted into the first epitaxial layer and secondepitaxial layer are diffused by heat treatment, thereby forming aparallel pn-layer formed by the first conductivity type thirdsemiconductor layer and second conductivity type fourth semiconductorlayer connected from the first epitaxial layer to the third epitaxiallayer being alternately disposed. At this time, along with the formationof the parallel pn-layer, a fifth semiconductor layer is formedconnected across the second region of the second epitaxial layer andthird epitaxial layer, thereby configuring the isolating structure (aneighth step).

Also, in order to solve the heretofore described problems, asemiconductor device manufacturing method according to the invention isa method of manufacturing a semiconductor device having a first regionin which a vertical semiconductor element is disposed and a secondregion in which a lateral semiconductor element electrically isolatedfrom the vertical semiconductor element by an isolating structure isdisposed, and has the following characteristics. Firstly, there isformed by epitaxial growth on a first conductivity type firstsemiconductor layer a first conductivity type first epitaxial layer withan impurity concentration lower than that of the first semiconductorlayer (a first step). Next, a first ion implantation of a firstconductivity type impurity is selectively carried out throughout thewhole of the first region of the first epitaxial layer (a second step).Next, a second ion implantation of a second conductivity type impurityis selectively carried out into a region of the first epitaxial layersandwiched by places of the first ion implantation (a third step). Next,after the third step, a first conductivity type second epitaxial layerhaving an impurity concentration the same as that of the first epitaxiallayer is formed by epitaxial growth on the first epitaxial layer (afourth step). Next, a third ion implantation of a first conductivitytype impurity is carried out into a region of the second epitaxial layerdirectly above a place of the first ion implantation and into the secondregion distanced from the region directly above the place of the firstion implantation (a fifth step). Next, after the fifth step, a fourthion implantation of a second conductivity type impurity is carried outinto a region of the second epitaxial layer directly above a place ofthe second ion implantation (a sixth step). Next, after the sixth step,a first conductivity type third epitaxial layer having an impurityconcentration the same as that of the second epitaxial layer is formedby epitaxial growth on the second epitaxial layer (a seventh step).Next, the first conductivity type impurity and second conductivity typeimpurity ion implanted into the first epitaxial layer and secondepitaxial layer are diffused by heat treatment, thereby forming aparallel pn-layer formed by the first conductivity type thirdsemiconductor layer and second conductivity type fourth semiconductorlayer connected from the first epitaxial layer to the third epitaxiallayer being alternately disposed. At this time, along with the formationof the parallel pn-layer, a fifth semiconductor layer is formedconnected across the second region of the second epitaxial layer andthird epitaxial layer, thereby configuring the isolating structure (aneighth step).

Also, in order to solve the heretofore described problems, asemiconductor device manufacturing method according to the invention isa method of manufacturing a semiconductor device having a first regionin which a vertical semiconductor element is disposed and a secondregion in which a lateral semiconductor element electrically isolatedfrom the vertical semiconductor element by an isolating structure isdisposed, and has the following characteristics. Firstly, there isformed by epitaxial growth on a first semiconductor layer a firstconductivity type first epitaxial layer with an impurity concentrationlower than that of the first semiconductor layer (a first step). Next, afirst ion implantation of a first conductivity type impurity is carriedout throughout the whole of the first region of the first epitaxiallayer (a second step). Next, a second ion implantation of a secondconductivity type impurity is selectively carried out into the firstregion of the first epitaxial layer into which the first ionimplantation has been carried out (a third step). Next, after the thirdstep, a first conductivity type second epitaxial layer having animpurity concentration the same as that of the first epitaxial layer isformed by epitaxial growth on the first epitaxial layer (a fourth step).Next, a third ion implantation of a first conductivity type impurity iscarried out into a region of the second epitaxial layer directly above aplace of the first ion implantation (a fifth step). Next, after thefifth step, a fourth ion implantation of a second conductivity typeimpurity is carried out into a region of the second epitaxial layerdirectly above a place of the second ion implantation and into thesecond region distanced from the region directly above the place of thefirst ion implantation (a sixth step). Next, after the sixth step, afirst conductivity type third epitaxial layer having an impurityconcentration the same as that of the second epitaxial layer is formedby epitaxial growth on the second epitaxial layer (a seventh step).Next, the first conductivity type impurity and second conductivity typeimpurity ion implanted into the first epitaxial layer and secondepitaxial layer are diffused by heat treatment, thereby forming aparallel pn-layer formed by the first conductivity type thirdsemiconductor layer and second conductivity type fourth semiconductorlayer connected from the first epitaxial layer to the third epitaxiallayer being alternately disposed. At this time, along with the formationof the parallel pn-layer, a fifth semiconductor layer is formedconnected across the second region of the second epitaxial layer andthird epitaxial layer, thereby configuring the isolating structure (aneighth step).

Also, in order to solve the heretofore described problems, asemiconductor device manufacturing method according to the invention isa method of manufacturing a semiconductor device having a first regionin which a vertical semiconductor element is disposed and a secondregion in which a lateral semiconductor element electrically isolatedfrom the vertical semiconductor element by an isolating structure isdisposed, and has the following characteristics. Firstly, there isformed by epitaxial growth on a first conductivity type firstsemiconductor layer a first conductivity type first epitaxial layer withan impurity concentration lower than that of the first semiconductorlayer (a first step). Next, a first ion implantation of a firstconductivity type impurity is selectively carried out into the firstregion of the first epitaxial layer (a second step). Next, a second ionimplantation of a second conductivity type impurity is selectivelycarried out into a region of the first epitaxial layer sandwiched byplaces of the first ion implantation (a third step). Next, after thethird step, a first conductivity type second epitaxial layer having animpurity concentration the same as that of the first epitaxial layer isformed by epitaxial growth on the first epitaxial layer (a fourth step).Next, a third ion implantation of a first conductivity type impurity iscarried out into a region of the second epitaxial layer directly above aplace of the first ion implantation (a fifth step). Next, after thefifth step, a fourth ion implantation of a second conductivity typeimpurity is carried out into a region of the second epitaxial layerdirectly above a place of the second ion implantation and into thesecond region distanced from the region directly above the place of thefirst ion implantation (a sixth step). Next, after the sixth step, afirst conductivity type third epitaxial layer having an impurityconcentration the same as that of the second epitaxial layer is formedby epitaxial growth on the second epitaxial layer (a seventh step).Next, the first conductivity type impurity and second conductivity typeimpurity ion implanted into the first epitaxial layer and secondepitaxial layer are diffused by heat treatment, thereby forming aparallel pn-layer formed by the first conductivity type thirdsemiconductor layer and second conductivity type fourth semiconductorlayer connected from the first epitaxial layer to the third epitaxiallayer being alternately disposed. At this time, along with the formationof the parallel pn-layer, a fifth semiconductor layer is formedconnected across the second region of the second epitaxial layer andthird epitaxial layer, thereby configuring the isolating structure (aneighth step).

Also, in order to solve the heretofore described problems, and achievethe objects of the invention, a semiconductor device manufacturingmethod according to the invention is a method of manufacturing asemiconductor device having a first region in which a verticalsemiconductor element is disposed and a second region in which a lateralsemiconductor element electrically isolated from the verticalsemiconductor element by an isolating structure is disposed, and has thefollowing characteristics. Firstly, there is formed by epitaxial growthon a first conductivity type first semiconductor layer a firstconductivity type first epitaxial layer with an impurity concentrationlower than that of the first semiconductor layer (a first step). Next, afirst ion implantation of a first conductivity type impurity is carriedout throughout the whole of the first epitaxial layer (a second step).Next, a second ion implantation of a second conductivity type impurityis selectively carried out into the first region of the first epitaxiallayer into which the first ion implantation has been carried out (athird step). Next, after the third step, a first conductivity typesecond epitaxial layer having an impurity concentration the same as thatof the first epitaxial layer is formed by epitaxial growth on the firstepitaxial layer (a fourth step). Next, a third ion implantation of afirst conductivity type impurity is carried out throughout the whole ofthe second epitaxial layer (a fifth step). Next, after the fifth step, afourth ion implantation of a second conductivity type impurity iscarried out into a region of the second epitaxial layer directly above aplace of the second ion implantation (a sixth step). Next, after thesixth step, a first conductivity type third epitaxial layer having animpurity concentration the same as that of the second epitaxial layer isformed by epitaxial growth on the second epitaxial layer (a seventhstep). Next, the first conductivity type impurity and secondconductivity type impurity ion implanted into the first epitaxial layerand second epitaxial layer are diffused by heat treatment, therebyforming a parallel pn-layer formed by the first conductivity type thirdsemiconductor layer and second conductivity type fourth semiconductorlayer connected from the first epitaxial layer to the third epitaxiallayer being alternately disposed. At this time, along with the formationof the parallel pn-layer, a fifth semiconductor layer is formed, that isconnected from the first semiconductor layer to the third epitaxiallayer, thereby configuring the isolating structure (an eighth step).

Also, the semiconductor device manufacturing method according to theinvention is characterized in that, in the heretofore described aspectof the invention, the second step to fourth step are repeatedly carriedout, thereby increasing the thickness of the parallel pn-layer.

Also, the semiconductor device manufacturing method according to theinvention is characterized in that, in the heretofore described aspectof the invention, the fourth step to sixth step are repeatedly carriedout, thereby increasing the thickness of the fifth semiconductor layer.

Also, the semiconductor device manufacturing method according to theinvention, in the heretofore described aspect of the invention, furtherhas the following characteristics. After the sixth step and before theseventh step, a first conductivity type fourth epitaxial layer is formedby epitaxial growth on the second epitaxial layer (a ninth step).Further, a fifth ion implantation of a first conductivity type impurityis carried out throughout the whole of the first region of the fourthepitaxial layer (a tenth step). Furthermore, after the tenth step, asixth ion implantation of a second conductivity type impurity isselectively carried out into a region of the fourth epitaxial layerdirectly above a place of the fourth ion implantation (an eleventhstep).

Also, the semiconductor device manufacturing method according to theinvention, in the heretofore described aspect of the invention, furtherhas the following characteristics. After the sixth step and before theseventh step, a first conductivity type fourth epitaxial layer is formedby epitaxial growth on the second epitaxial layer (a ninth step).Further, a fifth ion implantation of a first conductivity type impurityis carried out throughout the whole of the first region and into anouter peripheral portion of the second region of the fourth epitaxiallayer (a tenth step). Furthermore, after the tenth step, a sixth ionimplantation of a second conductivity type impurity is selectivelycarried out into a region of the fourth epitaxial layer directly above aplace of the fourth ion implantation (an eleventh step).

Also, the semiconductor device manufacturing method according to theinvention is such that, in the heretofore described aspect of theinvention, an element structure of a vertical semiconductor element isformed in the first region of the third epitaxial layer after the eighthstep. Also, an isolating portion reaching the fifth semiconductor layerfrom the surface of the third epitaxial layer is formed in an outerperipheral portion of the second region of the third epitaxial layer,and an element structure of a lateral semiconductor element is formed ina region of the third epitaxial layer bounded by the isolating portionand fifth semiconductor layer.

Also, the semiconductor device manufacturing method according to theinvention is characterized in that, in the heretofore described aspectof the invention, the isolating portion is a diffusion layer formed byan impurity ion implanted into the second region of the third epitaxiallayer after the eighth step being thermally diffused.

Also, the semiconductor device manufacturing method according to theinvention is characterized in that, in the heretofore described aspectof the invention, the isolating portion is configured of a trench formedin the second region of the third epitaxial layer after the eighth step.

According to the invention, by forming a lateral semiconductor elementin a region bounded by an isolating structure having a buried isolatinglayer (the fifth semiconductor layer), it is possible to suppressparasitic action between a lateral semiconductor element and superjunction structure vertical semiconductor element formed on the samesemiconductor substrate.

Also, according to the invention, along with a multiple of n⁻ epitaxiallayers for forming a parallel pn-layer configuring a super junctionstructure vertical semiconductor element, a buried isolating layer thatelectrically isolates a lateral semiconductor element and the verticalsemiconductor element is formed. Because of this, it is possible tointegrate the lateral semiconductor element bounded by the isolatingstructure and the super junction structure vertical semiconductorelement on the same substrate, at a low cost.

According to the semiconductor device and manufacturing method thereofaccording to the invention, an advantage is achieved in that it ispossible to suppress parasitic action between elements formed on thesame semiconductor substrate. Also, according to the semiconductordevice and manufacturing method thereof according to the invention, anadvantage is achieved in that it is possible to reduce cost.

BRIEF DESCRIPTION OF THE DRAWINGS

The foregoing advantages and features of the invention will becomeapparent upon reference to the following detailed description and theaccompanying drawings, of which:

FIG. 1 is a sectional view showing a configuration of a main portion ofa semiconductor device according to Embodiment 1 of the invention.

FIG. 2 is a sectional view showing a configuration of a main portion ofa semiconductor device according to Embodiment 2 of the invention.

FIG. 3 is a sectional view showing a configuration of a main portion ofa semiconductor device according to Embodiment 3 of the invention.

FIG. 4 is a sectional view showing a configuration of a main portion ofa semiconductor device according to Embodiment 4 of the invention.

FIG. 5 is a sectional view showing a configuration of a main portion ofa semiconductor device according to Embodiment 5 of the invention.

FIG. 6 is a sectional view showing a configuration of a main portion ofa semiconductor device according to Embodiment 6 of the invention.

FIG. 7 is a sectional view showing a configuration of a main portion ofa semiconductor device according to Embodiment 7 of the invention.

FIG. 8 is a sectional view showing a configuration of a main portion ofa semiconductor device according to Embodiment 8 of the invention.

FIG. 9 is a sectional view showing a configuration of a main portion ofa semiconductor device according to Embodiment 9 of the invention.

FIG. 10 is a sectional view showing a configuration of a main portion ofa semiconductor device according to Embodiment 10 of the invention.

FIG. 11 is a sectional view showing a configuration of a main portion ofa semiconductor device according to Embodiment 11 of the invention.

FIG. 12 is a sectional view showing a configuration of a main portion ofa semiconductor device according to Embodiment 12 of the invention.

FIGS. 13( a) to 13(d) are sectional views showing, in step order, asemiconductor device manufacturing method according to Embodiment 13 ofthe invention.

FIGS. 14( e) and 14(f) are sectional views showing, in step order, thesemiconductor device manufacturing method according to Embodiment 13 ofthe invention.

FIGS. 15( g) and 15(h) are sectional views showing, in step order, thesemiconductor device manufacturing method according to Embodiment 13 ofthe invention.

FIGS. 16( a) to 16(d) are sectional views showing, in step order, asemiconductor device manufacturing method according to Embodiment 14 ofthe invention.

FIGS. 17( e) and 17(f) are sectional views showing, in step order, thesemiconductor device manufacturing method according to Embodiment 14 ofthe invention.

FIGS. 18( g) and 18(h) are sectional views showing, in step order, thesemiconductor device manufacturing method according to Embodiment 14 ofthe invention.

FIGS. 19( a) to 19(d) are sectional views showing, in step order, asemiconductor device manufacturing method according to Embodiment 15 ofthe invention.

FIGS. 20( e) to 20(f) are sectional views showing, in step order, thesemiconductor device manufacturing method according to Embodiment 15 ofthe invention.

FIGS. 21( g) and 21(h) are sectional views showing, in step order, thesemiconductor device manufacturing method according to Embodiment 15 ofthe invention.

FIGS. 22( a) to 22(d) are sectional views showing, in step order, asemiconductor device manufacturing method according to Embodiment 16 ofthe invention.

FIGS. 23( e) and 23(f) are sectional views showing, in step order, thesemiconductor device manufacturing method according to Embodiment 16 ofthe invention.

FIGS. 24( g) and 24(h) are sectional views showing, in step order, thesemiconductor device manufacturing method according to Embodiment 16 ofthe invention.

FIG. 25 is a sectional view showing a semiconductor device manufacturingmethod according to Embodiment 17 of the invention.

FIGS. 26( a) and 26(b) are sectional views showing, in step order, asemiconductor device manufacturing method according to Embodiment 18 ofthe invention.

FIGS. 27( c) and 27(d) are sectional views showing, in step order, thesemiconductor device manufacturing method according to Embodiment 18 ofthe invention.

FIGS. 28( a) and 28(b) are sectional views showing, in step order, asemiconductor device manufacturing method according to Embodiment 19 ofthe invention.

FIGS. 29( c) and 29(d) are sectional views showing, in step order, thesemiconductor device manufacturing method according to Embodiment 19 ofthe invention.

FIG. 30 is a sectional view showing a semiconductor device manufacturingmethod according to Embodiment 20 of the invention.

FIG. 31 is a sectional view showing a configuration of a main portion ofa heretofore known intelligent switching device using dielectricisolating technology.

FIG. 32 is a sectional view showing a configuration of a main portion ofa heretofore known intelligent switching device using pn-junctionisolating technology.

FIG. 33 is a sectional view showing a configuration of a main portion ofanother heretofore known intelligent switching device using pn-junctionisolating technology.

DETAILED DESCRIPTION OF SPECIFIC EMBODIMENTS

Hereafter, referring to the attached drawings, a detailed descriptionwill be given of preferred embodiments of a semiconductor device andmanufacturing method thereof according to the invention. The followingdescription will be given with a first conductivity type as an n-typeand a second conductivity type as a p-type, but the first conductivitytype may also be a p-type and the second conductivity type an n-type. Inthe specification and attached drawings, a layer or region beingprefixed by n or p indicates that electrons or holes respectively aremajority carriers. Also, + or − being affixed to n or p indicates ahigher impurity concentration or lower impurity concentrationrespectively than that of a layer or region to which neither is affixed.In the following description of the embodiments and attached drawings,the same elements are given to identical configurations, and a redundantdescription is omitted.

Embodiment 1

FIG. 1 is a sectional view showing a configuration of a main portion ofa semiconductor device according to Embodiment 1 of the invention. Asshown in FIG. 1, a semiconductor device 100 is configured of an n⁻semiconductor layer (a second semiconductor layer) 2 that configures asemiconductor substrate, a super junction structure vertical MOSFET (avertical semiconductor element, hereafter assumed to be a vertical superjunction MOSFET) 101 formed in a first region S1, and a lateral MOSFET(a lateral semiconductor element) 102 formed in a second region S2. Asuper junction structure is a structure such that a pn-junction(parallel pn-layers) formed by n-layers and p-layers being repeatedlyalternately disposed is formed in a drift layer.

The vertical super junction MOSFET 101 is formed of an n⁺ semiconductorlayer (first semiconductor layer) 1 that forms an n-drain layer, the n⁻semiconductor layer 2 in contact with the n⁺ semiconductor layer 1, anda parallel pn-layer 31 formed inside the n⁻ semiconductor layer 2. Then⁺ semiconductor layer 1 is an n⁺ low resistance layer having animpurity concentration higher than that of the n⁻ semiconductor layer 2.The n⁻ semiconductor layer 2 is provided on the surface of the n⁺semiconductor layer 1. The n⁻ semiconductor layer 2 is an n⁻ highresistance layer having an impurity concentration lower than that of then⁺ semiconductor layer 1.

The parallel pn-layer 31 is formed of an n-layer (third semiconductorlayer) 3 and p-layer (fourth semiconductor layer) 4 configuring a superjunction structure. Specifically, the n-layer 3 is provided inside then⁻ semiconductor layer 2. The p-layer 4 is provided in the n-layer 3.The p-layer 4 extends in a vertical direction 40 with respect to mainsurfaces 2 f and 2 g of the n⁻ semiconductor layer 2, penetrating then-layer 3, and coming into contact with the n⁻ semiconductor layer 2.Also, the p-layer 4 is disposed in a predetermined cycle in a horizontaldirection with respect to the main surfaces 2 f and 2 g of the n⁻semiconductor layer 2.

In this way, the n-layer 3 and p-layer 4 are repeatedly alternatelydisposed in a horizontal direction 41 with respect to the main surfaces2 f and 2 g of the n⁻ semiconductor layer 2, configuring a superjunction structure. The n-layer 3 has an impurity concentration higherthan that of the n⁻ semiconductor layer 2. The p-layer 4 has an impurityconcentration higher than that of the n⁻ semiconductor layer 2. It ispreferable that the impurity concentration of the p-layer 4 ispractically equivalent to the impurity concentration of the n-layer 3.

The parallel pn-layer 31 is designed so that, when voltage is applied tothe vertical super junction MOSFET 101, a depletion layer (not shown)spreads through the whole of the n-layer 3 sandwiched by the p-layer 4and the p-layer 4. The n⁻ semiconductor layer 2 is a non-doped epitaxialgrowth layer. Specifically, the n⁻ semiconductor layer 2 is an epitaxialgrowth layer formed by, for example, an n⁻ semiconductor layer 2 a, ann⁻ semiconductor layer 2 b, an n⁻ semiconductor layer 2 c, and an n⁻semiconductor layer 2 d being stacked.

The n-layer 3 is formed over the whole of the first region S1 of the n⁻semiconductor layer 2 in which the vertical super junction MOSFET 101 isformed. The n-layer 3 is a diffusion layer formed by, for example,phosphorus (P) ion implanted throughout the whole of the first region S1of the n⁻ semiconductor layer 2 being diffused by heat treatment. Thep-layer 4 is a diffusion layer formed by, for example, boron (B) ionimplanted in the n-layer 3 being diffused by heat treatment.

A p-well region 5 in contact with the p-layer 4 and an n-drift region 6in contact with the n-layer 3 are selectively provided in a surfacelayer on the main surface 2 f side on the side opposite to the mainsurface 2 g on the n⁺ semiconductor layer 1 side of the n⁻ semiconductorlayer 2. The p-well region 5 is in contact with the n-drift region 6.The n-drift region 6 is sandwiched by neighboring p-well regions 5. Then-layer 3 also configures an n-drift layer. An n-source region 7 and ap-contact region 8 are selectively provided in a surface layer of thep-well region 5. A gate electrode 10 is provided across a gate oxidefilm 9 on the surface of the p-well region 5 sandwiched by the n-sourceregion 7 and n-drift region 6.

An interlayer dielectric 11 covers the gate electrode 10. A sourceelectrode 12 is electrically connected to the n-source region 7. A drainelectrode 13 is electrically connected to the n⁺ semiconductor layer 1,which forms the n-drain layer. The gate electrode 10, source electrode12, and drain electrode 13 are isolated from each other by the interlayer dielectric 11. In this way, the planar gate structure verticalsuper junction MOSFET 101 is provided in the first region S1 of the n⁻semiconductor layer 2.

An isolating structure formed of an n-buried isolating layer (a fifthsemiconductor layer) 15 and an n-diffused isolating layer 16 in contactwith the n-buried isolating layer 15 is provided in the second region S2of the n⁻ semiconductor layer 2. The n-buried isolating layer 15 isprovided inside the n⁻ semiconductor layer 2. The n-diffused isolatinglayer 16 is provided so as to reach the n-buried isolating layer 15 fromthe main surface 2 f on the side opposite to the main surface 2 g on then⁺ semiconductor layer 1 side of the n⁻ semiconductor layer 2. Then-diffused isolating layer 16 is provided so as to be in contact with,for example, an outer peripheral portion of the n-buried isolating layer15.

The n-buried isolating layer 15 has an impurity concentration higherthan that of the n⁻ semiconductor layer 2. Also, the n-buried isolatinglayer 15 has an impurity concentration practically equivalent to that ofthe n-layer 3 or p-layer 4. The n-diffused isolating layer 16 is adiffusion layer formed by thermal diffusion so as to reach the n-buriedisolating layer 15. The n-diffused isolating layer 16 has an impurityconcentration higher than that of, for example, the n⁻ semiconductorlayer 2.

The lateral MOSFET 102 is provided in a region of the n⁻ semiconductorlayer 2 bounded by the n-buried isolating layer 15 and n-diffusedisolating layer 16. Specifically, a p-well region 17, n-source region18, and n-drain region 19 configuring the lateral MOSFET 102 areprovided in a region of the n⁻ semiconductor layer 2 bounded by then-buried isolating layer 15 and n-diffused isolating layer 16.

The n-source region 18 and n-drain region 19 are selectively provided,distanced from each other, in a surface layer of the p-well region 17. Agate electrode 21 is provided across a gate oxide film 20 on the surfaceof a region of the p-well region 17 sandwiched by the n-source region 18and n-drain region 19. A source electrode 22 and drain electrode 23 areelectrically connected to the n-source region 18 and n-drain region 19respectively.

The gate electrode 21, source electrode 22, and drain electrode 23 areisolated from each other by the inter layer dielectric 11, which coversthe gate electrode 21. In this way, the planar gate structure lateralMOSFET 102 is provided in the second region S2 of the n⁻ semiconductorlayer 2. The interlayer insulating film 11 covers portions of thesurface of the n⁻ semiconductor layer 2 including the first and secondregions S1 and S2 on which no electrode is formed, from the first regionS1 to the second region S2.

As the semiconductor device 100 shown in FIG. 1 is such that then-buried isolating layer 15 and n-layer 3 are formed simultaneously, itis possible to reduce manufacturing cost. A method of manufacturing thesemiconductor device 100 will be described hereafter. Also, thesemiconductor device 100 shown in FIG. 1 is such that it is possible toincrease freedom of element design. The reason for this is as follows.

Generally, when forming another region in a region doped with animpurity, the impurity concentration of the other region is higher thanthe region doped with the impurity. Because of this, when forminganother region in a region doped with an impurity, the impurityconcentration selection range of the other region narrows, and thefreedom of element design decreases. As opposed to this, as thesemiconductor device 100 shown in FIG. 1 is such that the n-layer 3 andp-well regions 5 and 17 can be formed in the n⁻ semiconductor layer 2formed without doping, the impurity concentration selection range of then-layer 3 and p-well regions 5 and 17 widens. Consequently, it ispossible to increase the freedom of element design.

Also, the lateral MOSFET 102 is electrically isolated from the verticalsuper junction MOSFET 101 by the n-buried isolating layer 15 andn-diffused isolating layer 16, whose impurity concentrations are higherthan that of the n⁻ semiconductor layer 2. That is, the isolatingstructure formed of the n-buried isolating layer 15 and n-diffusedisolating layer 16, whose impurity concentrations are higher than thatof the n⁻ semiconductor layer 2, is provided in the semiconductor device100. Because of this, it is possible to attempt to suppress malfunctionof a parasitic transistor configured by the vertical super junctionMOSFET 101 and lateral MOSFET 102, and reduce leakage current in apn-junction portion of the parasitic transistor.

In the heretofore described example of the semiconductor device 100shown in FIG. 1, there is configured an integrated circuit wherein onlyone lateral MOSFET 102 is formed in the same semiconductor substrate(the n⁻ semiconductor layer 2) as the vertical super junction MOSFET101, but in actuality, the integrated circuit is configured by forming aplurality of lateral MOSFETs 102. When forming a plurality of lateralMOSFETs 102 in the same semiconductor substrate as the vertical superjunction MOSFET 101, each of the plurality of lateral MOSFETs 102 isbounded by an isolating structure formed of the n-buried isolating layer15 and n-diffused isolating layer 16, and is electrically isolated fromother elements.

As heretofore described, according to Embodiment 1, the lateral MOSFET102 is disposed in a region of the n⁻ semiconductor layer 2 configuringthe semiconductor substrate bounded by the n-buried isolating layer 15and n-diffused isolating layer 16. Because of this, the lateral MOSFET102 is electrically isolated from the vertical super junction MOSFET 101disposed in the same semiconductor substrate. Consequently, it ispossible to suppress parasitic operation between the vertical superjunction MOSFET 101 and lateral MOSFET 102 formed in the samesemiconductor substrate.

Embodiment 2

FIG. 2 is a sectional view showing a configuration of a main portion ofa semiconductor device according to Embodiment 2 of the invention. Asshown in FIG. 2, a semiconductor device 110 is configured of the n⁻semiconductor layer 2 that configures a semiconductor substrate, avertical super junction MOSFET 111 formed in the first region S1, and alateral MOSFET 112 formed in the second region S2.

The vertical super junction MOSFET 111 is formed of the n⁺ semiconductorlayer 1 that forms an n-drain layer, the n⁻ semiconductor layer 2 incontact with the n⁺ semiconductor layer 1, and the parallel pn-layer 31formed inside the n⁻ semiconductor layer 2. The parallel pn-layer 31 isformed of the n-layer 3 and p-layer 4 configuring a super junctionstructure. Specifically, the n-layer 3 and p-layer 4 extend in avertical direction with respect to the main surfaces 2 f and 2 g of thesemiconductor substrate (n⁻ semiconductor layer 2), and are repeatedlyalternately disposed in a horizontal direction with respect to the mainsurfaces 2 f and 2 g of the n⁻ semiconductor layer 2.

The parallel pn-layer 31 is designed so that, when voltage is applied tothe vertical super junction MOSFET 111, a depletion layer (not shown)spreads through the whole of the n-layer 3 sandwiched by the p-layer 4and the p-layer 4. The n⁻ semiconductor layer 2 is a non-doped epitaxialgrowth layer. Specifically, the n⁻ semiconductor layer 2 is an epitaxialgrowth layer formed by, for example, the n⁻ semiconductor layer 2 a, then⁻ semiconductor layer 2 b, the n⁻ semiconductor layer 2 c, and the n⁻semiconductor layer 2 d being sequentially stacked.

The n-layer 3 and p-layer 4 are each selectively formed in the firstregion S1 of the n⁻ semiconductor layer 2. The n-layer 3 is a diffusionlayer formed by, for example, phosphorus ion implanted in the firstregion S1 of the n⁻ semiconductor layer 2 being diffused by heattreatment. The p-layer 4 is a diffusion layer formed by, for example,boron ion implanted in the first region S1 of the n⁻ semiconductor layer2 being diffused by heat treatment.

The p-well region 5 in contact with the p-layer 4 and the n-drift region6 in contact with the n-layer 3 are selectively provided in a surfacelayer on the main surface 2 f side on the side opposite to the mainsurface 2 g on the n⁺ semiconductor layer 1 side of the n⁻ semiconductorlayer 2. The p-well region 5 is in contact with the n-drift region 6.The n-drift region 6 is sandwiched by neighboring p-well regions 5. Then-layer 3 also configures an n-drift layer.

The n-source region 7 and p-contact region 8 are selectively provided ina surface layer of the p-well region 5. The gate electrode 10 isprovided across the gate oxide film 9 on the surface of the p-wellregion 5 sandwiched by the n-source region 7 and n-drift region 6.

The inter layer dielectric 11 covers the gate electrode 10. The sourceelectrode 12 is electrically connected to the n-source region 7. Thedrain electrode 13 is electrically connected to the n⁺ semiconductorlayer 1, which forms the n-drain layer. The gate electrode 10, sourceelectrode 12, and drain electrode 13 are isolated from each other by theinter layer dielectric 11. In this way, the planar gate structurevertical super junction MOSFET 111 is provided in the first region S1 ofthe n⁻ semiconductor layer 2.

An isolating structure formed of the n-buried isolating layer 15 and then-diffused isolating layer 16 in contact with the n-buried isolatinglayer 15 is provided in the second region S2 of the n⁻ semiconductorlayer 2. The n-buried isolating layer 15 is provided inside the n⁻semiconductor layer 2. The n-diffused isolating layer 16 is provided soas to reach the n-buried isolating layer 15 from the main surface 2 f onthe side opposite to the main surface 2 g on the n⁺ semiconductor layer1 side of the n⁻ semiconductor layer 2. The n-diffused isolating layer16 is provided so as to be in contact with, for example, an outerperipheral portion of the n-buried isolating layer 15.

The lateral MOSFET 112 is provided in a region of the n⁻ semiconductorlayer 2 bounded by the n-buried isolating layer 15 and n-diffusedisolating layer 16. Specifically, the p-well region 17, n-source region18, and n-drain region 19 configuring the lateral MOSFET 112 areprovided in a region of the n⁻ semiconductor layer 2 bounded by then-buried isolating layer 15 and n-diffused isolating layer 16. Then-source region 18 and n-drain region 19 are selectively provided,distanced from each other, in a surface layer of the p-well region 17.

The gate electrode 21 is provided across the gate oxide film 20 on thesurface of a region of the p-well region 17 sandwiched by the n-sourceregion 18 and n-drain region 19. The source electrode 22 and drainelectrode 23 are electrically connected to the n-source region 18 andn-drain region 19 respectively.

The gate electrode 21, source electrode 22, and drain electrode 23 areisolated from each other by the inter layer dielectric 11, which coversthe gate electrode 21. In this way, the planar gate structure lateralMOSFET 112 is provided in the second region S2 of the n⁻ semiconductorlayer 2. The inter layer dielectric 11 covers portions of the surface ofthe n⁻ semiconductor layer 2 including the first and second regions S1and S2 on which no electrode is formed, from the first region S1 to thesecond region S2.

The impurity concentration of each region of the vertical super junctionMOSFET 111 and lateral MOSFET 112 is the same as the impurityconcentration of each region of the vertical super junction MOSFET andlateral MOSFET configuring the semiconductor device according toEmbodiment 1.

As the semiconductor device 110 shown in FIG. 2 is such that the n-layer3, p-layer 4, and p-well regions 5 and 17 can be formed in the n⁻semiconductor layer 2 formed without doping, the impurity concentrationselection range of the n-layer 3, p-layer 4, and p-well regions 5 and 17widens. Consequently, it is possible to increase the freedom of elementdesign.

As heretofore described, according to Embodiment 2, it is possible toobtain the same advantage as with the semiconductor device according toEmbodiment 1. Also, as the semiconductor device 110 shown in FIG. 2 issuch that each of the n-layer 3 and p-layer 4 is selectively formed inthe n⁻ semiconductor layer 2 formed without doping using an epitaxialgrowth method, it is possible to increase the freedom of element designin comparison with that of the semiconductor device according toEmbodiment 1.

Embodiment 3

FIG. 3 is a sectional view showing a configuration of a main portion ofa semiconductor device according to Embodiment 3 of the invention. Asshown in FIG. 3, a semiconductor device 120 is configured of the n⁻semiconductor layer 2 that configures a semiconductor substrate, avertical super junction MOSFET 121 formed in the first region S1, and alateral MOSFET 122 formed in the second region S2.

The vertical super junction MOSFET 121 is formed of the n⁺ semiconductorlayer 1 that forms an n-drain layer, the n⁻ semiconductor layer 2disposed on the surface of the n⁺ semiconductor layer 1, the n-layer 3disposed inside the n⁻ semiconductor layer 2, and the p-layer 4 disposedpenetrating the n-layer 3. The n-layer 3 is provided from the firstregion S1 to the second region S2 of the n⁻ semiconductor layer 2. Thep-layer 4 is provided in the n-layer 3 on the first region S1 side ofthe n⁻ semiconductor layer 2.

The n-layer 3 and p-layer 4 configure the parallel pn-layer 31, which isa super junction structure. Specifically, the p-layer 4 extends in avertical direction with respect to the main surfaces 2 f and 2 g of thesemiconductor substrate (n⁻ semiconductor layer 2), penetrating then-layer 3, and coming into contact with the n⁻ semiconductor layer 2.Also, the p-layer 4 is disposed in a predetermined cycle in a horizontaldirection with respect to the main surfaces 2 f and 2 g of the n⁻semiconductor layer 2. In this way, the n-layer 3 and p-layer 4 arerepeatedly alternately disposed in a horizontal direction with respectto the main surfaces 2 f and 2 g of the n⁻ semiconductor layer 2,configuring a super junction structure.

The parallel pn-layer 31 is designed so that, when voltage is applied tothe vertical super junction MOSFET 121, a depletion layer (not shown)spreads through the whole of the n-layer 3 sandwiched by the p-layer 4and the p-layer 4. The n⁻ semiconductor layer 2 is a non-doped epitaxialgrowth layer. Specifically, the n⁻ semiconductor layer 2 is an epitaxialgrowth layer formed by, for example, the n⁻ semiconductor layer 2 a, then⁻ semiconductor layer 2 b, the n⁻ semiconductor layer 2 c, and the n⁻semiconductor layer 2 d being sequentially stacked.

The n-layer 3 is a diffusion layer formed by, for example, phosphorusion implanted throughout the whole of the n⁻ semiconductor layer 2,which is a non-doped epitaxial growth layer, including the first regionS1 and second region S2, being diffused by heat treatment. The p-layer 4is a diffusion layer formed by, for example, boron ion implanted in then-layer 3 being diffused by heat treatment.

The p-well region 5 in contact with the p-layer 4 and the n-drift region6 in contact with the n-layer 3 are selectively provided in a surfacelayer on the main surface 2 f side on the side opposite to the mainsurface 2 g on the n⁺ semiconductor layer 1 side of the n⁻ semiconductorlayer 2. The p-well region 5 is in contact with the n-drift region 6.The n-drift region 6 is sandwiched by neighboring p-well regions 5. Then-layer 3 also configures an n-drift layer.

The n-source region 7 and p-contact region 8 are selectively provided ina surface layer of the p-well region 5. The gate electrode 10 isprovided across the gate oxide film 9 on the surface of the p-wellregion 5 sandwiched by the n-source region 7 and n-drift region 6.

The inter layer dielectric 11 covers the gate electrode 10. The sourceelectrode 12 is electrically connected to the n-source region 7. Thedrain electrode 13 is electrically connected to the n⁺ semiconductorlayer 1, which forms the n-drain layer. The gate electrode 10, sourceelectrode 12, and drain electrode 13 are isolated from each other by theinter layer dielectric 11. In this way, the planar gate structurevertical super junction MOSFET 121 is provided in the first region S1 ofthe n⁻ semiconductor layer 2.

An isolating structure formed of the n-layer 3, which forms an n-buriedisolating layer, and the n-diffused isolating layer 16 in contact withthe n-layer 3 forming the n-buried isolating layer is provided in thesecond region S2 of the n⁻ semiconductor layer 2. The n-diffusedisolating layer 16 is provided so as to reach the n-buried isolatinglayer from the main surface 2 f on the side opposite to the main surface2 g on the n⁺ semiconductor layer 1 side of the n⁻ semiconductor layer2. The n-diffused isolating layer 16 is formed by thermal diffusion soas to reach the n-layer 3 forming the n-buried isolating layer.

The lateral MOSFET 122 is provided in a region of the n⁻ semiconductorlayer 2 bounded by the n-layer 3 forming the n-buried isolating layerand the n-diffused isolating layer 16. Specifically, the p-well region17, n-source region 18, and n-drain region 19 configuring the lateralMOSFET 122 are provided in a region of the n⁻ semiconductor layer 2bounded by the n-layer 3 forming the n-buried isolating layer and then-diffused isolating layer 16.

The n-source region 18 and n-drain region 19 are selectively provided,distanced from each other, in a surface layer of the p-well region 17.The gate electrode 21 is provided across the gate oxide film 20 on thesurface of a region of the p-well region 17 sandwiched by the n-sourceregion 18 and n-drain region 19. The source electrode 22 and drainelectrode 23 are electrically connected to the n-source region 18 andn-drain region 19 respectively.

The gate electrode 21, source electrode 22, and drain electrode 23 areisolated from each other by the inter layer dielectric 11, which coversthe gate electrode 21. The inter layer dielectric 11 covers portions ofthe surface of the semiconductor substrate (n⁻ semiconductor layer 2) onwhich no electrode is formed, from the first region S1 to the secondregion S2. In this way, the planar gate structure lateral MOSFET 122 isprovided in the second region S2 of the n⁻ semiconductor layer 2.

The impurity concentration of each region of the vertical super junctionMOSFET 121 and lateral MOSFET 122 is the same as the impurityconcentration of each region of the vertical super junction MOSFET andlateral MOSFET configuring the semiconductor device according toEmbodiment 1.

The semiconductor device 120 shown in FIG. 3 is such that the n-layer 3functioning as the buried isolating layer is thicker than that in thesemiconductor device according to Embodiment 1. Because of this, incomparison with the semiconductor device according to Embodiment 1, itis possible to increase the advantages of suppressing malfunction of aparasitic transistor configured by the vertical super junction MOSFET121 and lateral MOSFET 122, and reducing leakage current in apn-junction portion of the parasitic transistor.

As heretofore described, according to Embodiment 3, it is possible toobtain the same advantages as with the semiconductor device according toEmbodiment 1.

Embodiment 4

FIG. 4 is a sectional view showing a configuration of a main portion ofa semiconductor device according to Embodiment 4 of the invention. Adifference between a semiconductor device 130 shown in FIG. 4 and thesemiconductor device 100 shown in FIG. 1 is that the n-buried isolatinglayer 15 and n-diffused isolating layer 16 configuring the isolatingstructure in the semiconductor device 100 are changed to a p-buriedisolating layer 24 and p-diffused isolating layer 25 in thesemiconductor device 130.

That is, the semiconductor device 130 is such that a vertical superjunction MOSFET 131 and lateral MOSFET 132 are electrically isolated bythe lateral MOSFET 132 being bounded by the p-buried isolating layer 24and p-diffused isolating layer 25, whose conductivity differs from thatof the n⁻ semiconductor layer 2. Configurations of the semiconductordevice 130 other than the p-buried isolating layer 24 and p-diffusedisolating layer 25 are the same as in the semiconductor device 100 shownin FIG. 1.

With the semiconductor device 130 too, it is possible to obtain theadvantages of suppressing malfunction of a parasitic transistorconfigured by the vertical super junction MOSFET 131 and lateral MOSFET132, and reducing leakage current in a pn-junction portion of theparasitic transistor, in the same way as with the semiconductor device100 shown in FIG. 1.

The configuration wherein the n-buried isolating layer 15 and n-diffusedisolating layer 16 configuring the isolating structure are changed tothe p-buried isolating layer 24 and p-diffused isolating layer 25 canalso be applied to the semiconductor device 110 shown in FIG. 2, whereinthe n-layer 3 and p-layer 4 of the parallel pn-layer 31 are selectivelyformed in the n⁻ semiconductor layer 2.

Also, the configuration wherein the n-diffused isolating layer 16configuring the isolating structure is changed to the p-diffusedisolating layer 25 can also be applied to the semiconductor device 120shown in FIG. 3, wherein the n-layer 3 is formed over the whole of then⁻ semiconductor layer 2.

As heretofore described, according to Embodiment 4, it is possible toobtain the same advantages as with the semiconductor device according toEmbodiment 1.

Embodiment 5

FIG. 5 is a sectional view showing a configuration of a main portion ofa semiconductor device according to Embodiment 5 of the invention. Adifference between a semiconductor device 140 shown in FIG. 5 and thesemiconductor device 100 shown in FIG. 1 is that the lateral MOSFET 102assumed to be an n-channel type in the semiconductor device 100 ischanged to a p-channel type lateral MOSFET 142 in the semiconductordevice 140.

In the semiconductor device 140, a reference sign 18 a and element 19 aare a p-source region and a p-drain region. Also, a region of the n⁻semiconductor layer 2 bounded by the n-buried isolating layer 15 andn-diffused isolating layer 16 forms an n-well region. The configurationof a vertical super junction MOSFET 141 is the same as that of thevertical super junction MOSFET of the semiconductor device 100 shown inFIG. 1.

The configuration wherein the lateral MOSFET is a p-channel type canalso be applied to the semiconductor device 110 shown in FIG. 2, whereinthe n-layer 3 and p-layer 4 of the parallel pn-layer 31 are selectivelyformed in the n⁻ semiconductor layer 2, and to the semiconductor device120 shown in FIG. 3, wherein the n-layer 3 is formed over the whole ofthe n⁻ semiconductor layer 2.

As heretofore described, according to Embodiment 5, it is possible toobtain the same advantages as with the semiconductor device according toEmbodiment 1.

Embodiment 6

FIG. 6 is a sectional view showing a configuration of a main portion ofa semiconductor device according to Embodiment 6 of the invention. Adifference between a semiconductor device 150 shown in FIG. 6 and thesemiconductor device 140 shown in FIG. 5 is that the n-buried isolatinglayer 15 and n-diffused isolating layer 16 configuring the isolatingstructure in the semiconductor device 140 are changed to the p-buriedisolating layer 24 and p-diffused isolating layer 25 in thesemiconductor device 150.

That is, the semiconductor device 150 is such that a vertical superjunction MOSFET 151 and lateral MOSFET 152 are electrically isolated bythe lateral MOSFET 152 being bounded by the p-buried isolating layer 24and p-diffused isolating layer 25, whose conductivity differs from thatof the n⁻ semiconductor layer 2. Configurations of the semiconductordevice 150 other than the p-buried isolating layer 24 and p-diffusedisolating layer 25 are the same as in the semiconductor device 140 shownin FIG. 5.

When changing the region configuring the isolating structure to a p-typein this way too, it is possible to obtain the advantages of suppressingmalfunction of a parasitic transistor configured by the vertical superjunction MOSFET 151 and lateral MOSFET 152, and reducing leakage currentin a pn-junction portion of the parasitic transistor, in the same way aswith the semiconductor device 140 shown in FIG. 5.

The configuration wherein the lateral MOSFET is changed from ann-channel type to a p-channel type and the n-buried isolating layer 15and n-diffused isolating layer 16 configuring the isolating structureare changed to the p-buried isolating layer 24 and p-diffused isolatinglayer 25 can also be applied to the semiconductor device 110 shown inFIG. 2, wherein the n-layer 3 and p-layer 4 of the parallel pn-layer 31are selectively formed in the n⁻ semiconductor layer 2.

Also, the configuration wherein the lateral MOSFET is changed from ann-channel type to a p-channel type and the n-diffused isolating layer 16configuring the isolating structure is changed to the p-diffusedisolating layer 25 can also be applied to the semiconductor device 120shown in FIG. 3, wherein the n-layer 3 is formed over the whole of then⁻ semiconductor layer 2.

As heretofore described, according to Embodiment 6, it is possible toobtain the same advantages as with the semiconductor device according toEmbodiment 5.

Embodiment 7

FIG. 7 is a sectional view showing a configuration of a main portion ofa semiconductor device according to Embodiment 7 of the invention. Adifference between a semiconductor device 160 shown in FIG. 7 and thesemiconductor device 100 shown in FIG. 1 is that an n-layer 26 isprovided in the semiconductor device 160 as one portion of an isolatingstructure between the n-buried isolating layer 15 and n-diffusedisolating layer 16. The n-layer 26 is formed so as to be in contactwith, for example, an outer peripheral portion of the n-buried isolatinglayer 15. The semiconductor device 160 is such that, by the n-layer 26being provided as one portion of the isolating structure, the thicknessof the n⁻ semiconductor layer 2, which is an n⁻ high resistance layer incontact with the p-well region 17, is greater than that in thesemiconductor device 100.

The semiconductor device 160 is such that an isolating structure isconfigured of the n-diffused isolating layer 16, n-buried isolatinglayer 15, and n-layer 26, electrically isolating a vertical superjunction MOSFET 161 and a lateral MOSFET 162. Configurations of thesemiconductor device 160 other than the n-layer 26 are the same as inthe semiconductor device 100 shown in FIG. 1.

By adopting the configuration of the semiconductor device 160, theportion of a region of the n⁻ semiconductor layer 2 bounded by then-diffused isolating layer 16, n-buried isolating layer 15, and n-layer26 through which a depletion layer spreads increases. Because of this,it is possible to increase the breakdown voltage of the portion boundedby the isolating structure, that is, of the lateral MOSFET 162.

The isolating structure configured of the n-diffused isolating layer 16,n-buried isolating layer 15, and n-layer 26 can also be applied to thesemiconductor device 110 shown in FIG. 2, wherein the n-layer 3 andp-layer 4 of the parallel pn-layer 31 are selectively formed in the n⁻semiconductor layer 2.

Also, although omitted from the drawings, the isolating structure mayalso be configured of a p-diffused isolating layer, a p-buried isolatinglayer, and a p-layer. An isolating structure configured of a p-diffusedisolating layer, a p-buried isolating layer, and a p-layer can also beapplied to the semiconductor device 110 shown in FIG. 2, wherein then-layer 3 and p-layer 4 of the parallel pn-layer 31 are selectivelyformed in the n⁻ semiconductor layer 2, or to the semiconductor device120 shown in FIG. 3, wherein the n-layer 3 is formed over the whole ofthe n⁻ semiconductor layer 2.

As heretofore described, according to Embodiment 7, it is possible toobtain the same advantages as with the semiconductor device according toEmbodiment 1.

Embodiment 8

FIG. 8 is a sectional view showing a configuration of a main portion ofa semiconductor device according to Embodiment 8 of the invention. Adifference between a semiconductor device 170 shown in FIG. 8 and thesemiconductor device 100 shown in FIG. 1 is that the n-buried isolatinglayer 15 in the semiconductor device 170 is formed more thickly thanthat in the semiconductor device 100. Configurations of thesemiconductor device 170 other than the thickness of the n-buriedisolating layer 15 are the same as in the semiconductor device 100 shownin FIG. 1.

By the n-buried isolating layer 15 configuring the isolating structurebeing formed more thickly than that in the semiconductor device 100shown in FIG. 1, it is possible to increase the advantages ofsuppressing malfunction of a parasitic transistor formed by a verticalsuper junction MOSFET 171 and lateral MOSFET 172, and reducing leakagecurrent in a pn-junction portion of the parasitic transistor.

The configuration wherein the n-buried isolating layer 15 configuring anisolating structure is formed more thickly than that in thesemiconductor device 100 shown in FIG. 1 can also be applied to thesemiconductor device 110 shown in FIG. 2, wherein the n-layer 3 andp-layer 4 of the parallel pn-layer 31 are selectively formed in the n⁻semiconductor layer 2.

As heretofore described, according to Embodiment 8, it is possible toobtain the same advantages as with the semiconductor device according toEmbodiment 1.

Embodiment 9

FIG. 9 is a sectional view showing a configuration of a main portion ofa semiconductor device according to Embodiment 9 of the invention. Adifference between a semiconductor device 180 shown in FIG. 9 and thesemiconductor device 160 shown in FIG. 7 is that in the semiconductordevice 180, an n-diffused isolating layer 16 a is formed deeply so as toreach the n-buried isolating layer 15, without providing the n-layer 26of the semiconductor device 160.

That is, the semiconductor device 180 is such that an isolatingstructure is configured of the n-buried isolating layer 15 andn-diffused isolating layer 16 a, and the thickness of the n⁻semiconductor layer 2 in contact with the p-well region 17 is greaterthan that in the semiconductor device 100 shown in FIG. 1. A verticalsuper junction MOSFET 181 and lateral MOSFET 182 are electricallyisolated by the isolating structure formed of the n-buried isolatinglayer 15 and n-diffused isolating layer 16 a. Configurations of thesemiconductor device 180 other than the deepness of the n-diffusedisolating layer 16 a are the same as in the semiconductor device 160shown in FIG. 7.

By adopting the configuration of the semiconductor device 180, it ispossible to increase the breakdown voltage of the lateral MOSFET 182, inthe same way as with the semiconductor device 160 shown in FIG. 7. Theconfiguration wherein the isolating structure is configured of then-buried isolating layer 15 and n-diffused isolating layer 16 a and thethickness of the n⁻ semiconductor layer 2 in contact with the p-wellregion 17 is formed to be greater than that in the semiconductor device100 shown in FIG. 1 can also be applied to the semiconductor device 110shown in FIG. 2, wherein the n-layer 3 and p-layer 4 of the parallelpn-layer 31 are selectively formed in the n⁻ semiconductor layer 2.

Also, although omitted from the drawings, the isolating structure mayalso be configured of a p-diffused isolating layer, a p-buried isolatinglayer, and a p-layer. An isolating structure configured of a p-diffusedisolating layer, a p-buried isolating layer, and a p-layer can also beapplied to the semiconductor device 110 shown in FIG. 2, wherein then-layer 3 and p-layer 4 of the parallel pn-layer 31 are selectivelyformed in the n⁻ semiconductor layer 2, or to the semiconductor device120 shown in FIG. 3, wherein the n-layer 3 is formed over the whole ofthe n⁻ semiconductor layer 2.

As heretofore described, according to Embodiment 9, it is possible toobtain the same advantages as with the semiconductor device according toEmbodiment 7.

Embodiment 10

FIG. 10 is a sectional view showing a configuration of a main portion ofa semiconductor device according to Embodiment 10 of the invention. Adifference between a semiconductor device 190 shown in FIG. 10 and thesemiconductor device 100 shown in FIG. 1 is that the n-diffusedisolating layer 16 in the semiconductor device 100 is changed to atrench isolating structure 27 in the semiconductor device 190.

In the semiconductor device 190, the trench isolating structure 27 has aconfiguration wherein an insulating film is formed on the side walls andbottom surface of a trench 27 a, and polysilicon is embedded inside thetrench 27 a across the insulating film. The trench isolating structure27 is provided to a depth reaching the n-buried isolating layer 15. Thetrench isolating structure 27 may also be of a configuration wherein thewhole of the inside of the trench 27 a is filled with an insulatingmaterial. Configurations of the semiconductor device 190 other than thetrench isolating structure 27 are the same as in the semiconductordevice 100 shown in FIG. 1.

By adopting the configuration of the semiconductor device 190, it ispossible to obtain the advantages of suppressing malfunction of aparasitic transistor formed by a vertical super junction MOSFET 191 andlateral MOSFET 192, and reducing leakage current in a pn-junctionportion of the parasitic transistor, in the same way as with thesemiconductor device 100 shown in FIG. 1.

An isolating structure configured of the n-buried isolating layer 15 andtrench isolating structure 27 can also be applied to the semiconductordevice 110 shown in FIG. 2, wherein the n-layer 3 and p-layer 4 of theparallel pn-layer 31 are selectively formed in the n⁻ semiconductorlayer 2, or to the semiconductor device 120 shown in FIG. 3, wherein then-layer 3 is formed over the whole of the n⁻ semiconductor layer 2.

Also, although omitted from the drawings, the isolating structure mayalso be configured of a p-diffused isolating layer, a p-buried isolatinglayer, and a p-layer. An isolating structure configured of a p-diffusedisolating layer, a p-buried isolating layer, and a p-layer can also beapplied to the semiconductor device 110 shown in FIG. 2, wherein then-layer 3 and p-layer 4 of the parallel pn-layer 31 are selectivelyformed in the n⁻ semiconductor layer 2, or to the semiconductor device120 shown in FIG. 3, wherein the n-layer 3 is formed over the whole ofthe n⁻ semiconductor layer 2.

As heretofore described, according to Embodiment 10, it is possible toobtain the same advantages as with the semiconductor device according toEmbodiment 1.

Embodiment 11

FIG. 11 is a sectional view showing a configuration of a main portion ofa semiconductor device according to Embodiment 11 of the invention. Adifference between a semiconductor device 200 shown in FIG. 11 and thesemiconductor device 100 shown in FIG. 1 is that the impurityconcentration of an n-buried isolating layer 28 configuring an isolatingstructure in the semiconductor device 200 is higher than that of then-layer 3. Configurations of the semiconductor device 200 other than theimpurity concentration of the n-buried isolating layer 28 are the sameas in the semiconductor device 100 shown in FIG. 1.

By adopting the configuration of the semiconductor device 200, it ispossible to increase the advantages of suppressing malfunction of aparasitic transistor formed by a vertical super junction MOSFET 201 andlateral MOSFET 202, and reducing leakage current in a pn-junctionportion of the parasitic transistor.

An isolating structure configured of the n-diffused isolating layer 16and n-buried isolating layer 28 can also be applied to the semiconductordevice 110 shown in FIG. 2, wherein the n-layer 3 and p-layer 4 of theparallel pn-layer 31 are selectively formed in the n⁻ semiconductorlayer 2, or to the semiconductor device 120 shown in FIG. 3, wherein then-layer 3 is formed over the whole of the n⁻ semiconductor layer 2.

Also, although omitted from the drawings, the isolating structure mayalso be configured of a p-diffused isolating layer, a p-buried isolatinglayer, and a p-layer. An isolating structure configured of a p-diffusedisolating layer, a p-buried isolating layer, and a p-layer can also beapplied to the semiconductor device 110 shown in FIG. 2, wherein then-layer 3 and p-layer 4 of the parallel pn-layer 31 are selectivelyformed in the n⁻ semiconductor layer 2, or to the semiconductor device120 shown in FIG. 3, wherein the n-layer 3 is formed over the whole ofthe n⁻ semiconductor layer 2.

As heretofore described, according to Embodiment 11, it is possible toobtain the same advantages as with the semiconductor device according toEmbodiment 1.

Embodiment 12

FIG. 12 is a sectional view showing a configuration of a main portion ofa semiconductor device according to Embodiment 12 of the invention. Adifference between a semiconductor device 210 shown in FIG. 12 and thesemiconductor device 100 shown in FIG. 1 is that, in the semiconductordevice 210, the gate structure of a vertical super junction MOSFET 211is changed from a planar gate structure to a trench gate structure.

Element 10 a in FIG. 12 is a gate portion trench, while element 10 b isa gate oxide film. That is, the semiconductor device 210 is such thatthe trench 10 a is provided between neighboring p-well regions 5, incontact with the p-well regions 5 and reaching the n-layer 3 of theparallel pn-layer 31. Further, the gate electrode 10 is embedded insidethe trench 10 a, across the gate oxide film 10 b. Configurations of thevertical super junction MOSFET 211 other than the gate structure are thesame as those of the vertical super junction MOSFET of the semiconductordevice 100 shown in FIG. 1. The configuration of a lateral MOSFET 212 isthe same as that of the lateral MOSFET of the semiconductor device 100shown in FIG. 1.

As the configuration of the semiconductor device 210 has no J-FETeffect, it has an advantage in that it is possible to attempt areduction of on-state resistance. The configuration wherein the verticalsuper junction MOSFET 211 has a trench gate structure can also beapplied to the semiconductor device 110 shown in FIG. 2, wherein then-layer 3 and p-layer 4 of the parallel pn-layer 31 are selectivelyformed in the n⁻ semiconductor layer 2, or to the semiconductor device120 shown in FIG. 3, wherein the n-layer 3 is formed over the whole ofthe n⁻ semiconductor layer 2.

As heretofore described, according to Embodiment 12, it is possible toobtain the same advantages as with the semiconductor device according toEmbodiment 1.

Embodiment 13

FIG. 13 to FIG. 15 are sectional views showing, in step order, asemiconductor device manufacturing method according to Embodiment 13 ofthe invention. In Embodiment 13, a description will be given of a methodof manufacturing the semiconductor device 100 according to Embodiment 1shown in FIG. 1. Firstly, a support substrate, which is to form the n⁺semiconductor layer 1, is prepared. The n⁺ semiconductor layer 1 formsthe n-drain layer of the vertical super junction MOSFET 101 (FIG. 13(a)).

Next, the n⁻ semiconductor layer 2 a is epitaxially grown to a thicknessof in the region of, for example, 7 μm, without doping, on the n⁺semiconductor layer 1. Next, an n-type impurity (for example, phosphorusor the like) ion implantation 53 a is carried out throughout the wholeof the first region S1, in which the vertical super junction MOSFET 101is formed, of the n⁻ semiconductor layer 2 a, forming an n-type ionimplantation layer 3 a in a surface layer of the first region S1 of then⁻ semiconductor layer 2 a (FIG. 13( b)).

The ion implantation 53 a into the n⁻ semiconductor layer 2 a is carriedout, for example, with a resist mask (not shown) having an apertureportion that exposes the whole of the first region S1 of the n⁻semiconductor layer 2 a as a mask. That is, the region of the n⁻semiconductor layer 2 a in which the n-type ion implantation layer 3 ais to be formed is exposed in the aperture portion of the resist mask.The resist mask used in the ion implantation 53 a is, for example,formed in advance on the surface of the n⁻ semiconductor layer 2 abefore the ion implantation 53 a into the n⁻ semiconductor layer 2 a iscarried out, and removed before the formation of a resist mask used in asubsequent ion implantation 54 a into the n-type ion implantation layer3 a.

Hereafter, although a description and depiction of a resist mask whenions are implanted are omitted, a resist mask is used when animplantation of ions into a semiconductor layer or ion implantationlayer is carried out, in the same way as for the ion implantation 53 ainto the n⁻ semiconductor layer 2 a (in Embodiments 14 to 20 too,although a description and depiction are omitted in the same way, aresist mask is used when ions are implanted).

Specifically, when an implantation of ions into a semiconductor layer orion implantation layer is carried out, a resist mask having an apertureportion that selectively exposes a desired region of the semiconductorlayer or ion implantation layer is formed. Then, after the resist maskis used as a mask for ion implantation, it is removed before theformation of a resist mask when ions are next implanted, or before theformation of an epitaxial layer.

Next, a p-type impurity (for example, boron or the like) ionimplantation 54 a is selectively carried out into the n-type ionimplantation layer 3 a, forming a plurality of p-type ion implantationlayers 4 a in a surface layer of the n-type ion implantation layer 3 a(FIG. 13( c)). The dose of the p-type impurity of the ion implantation54 a into the n-type ion implantation layer 3 a is a dose larger thanthe dose of the n-type impurity of the ion implantation 53 a into the n⁻semiconductor layer 2 a when forming the n-type ion implantation layer 3a.

Next, the n⁻ semiconductor layer 2 b is epitaxially grown to a thicknessof in the region of, for example, 7 μm, without doping, on the n⁻semiconductor layer 2 a. Next, an n-type impurity ion implantation 53 bis carried out throughout the whole of the first region S1 of the n⁻semiconductor layer 2 b, forming an n-type ion implantation layer 3 b ina surface layer of the first region S1 of the n⁻ semiconductor layer 2b. Then, a p-type impurity ion implantation 54 b is selectively carriedout into regions of the n-type ion implantation layer 3 b directly abovethe p-type ion implantation layers 4 a, forming a plurality of p-typeion implantation layers 4 b in a surface layer of the n-type ionimplantation layer 3 b (FIG. 13( d)).

The dose of the p-type impurity of the ion implantation 54 b into then-type ion implantation layer 3 b is a dose larger than the dose of then-type impurity of the ion implantation 53 b into the n⁻ semiconductorlayer 2 b when forming the n-type ion implantation layer 3 b. Although adepiction is omitted from FIG. 13( d), the steps of forming the n⁻semiconductor layer 2 b, the n-type ion implantation layer 3 b, and thep-type ion implantation layer 4 b (the steps of FIG. 13( d)) arenormally repeated in the region of six or seven times, increasing thethickness of the parallel pn-layer 31 after completion.

Next, the n⁻ semiconductor layer 2 c is epitaxially grown to a thicknessof in the region of, for example, 7 μm, without doping, on the n⁻semiconductor layer 2 b. Then, an n-type impurity ion implantation 53 cis carried out throughout each of the whole of the first region S1 andthe whole of the second region S2, in which the n-buried isolating layer15 is formed, of the n⁻ semiconductor layer 2 c. By so doing, an n-typeion implantation layer 3 c is formed in a surface layer of the firstregion S1 of the n⁻ semiconductor layer 2 c, and an n-type ionimplantation layer 15 a is formed in a surface layer of the secondregion S2 of the n⁻ semiconductor layer 2 c.

Next, a p-type impurity ion implantation 54 c is selectively carried outinto regions of the n-type ion implantation layer 3 c directly above thep-type ion implantation layers 4 b, forming a plurality of p-type ionimplantation layers 4 c in a surface layer of the n-type ionimplantation layer 3 c (FIG. 14( e)). The p-type ion implantation layers4 a to 4 c are formed so as to be aligned in a vertical direction withrespect to a main surface of the semiconductor substrate formed of then⁻ semiconductor layers 2 a to 2 c configuring the n⁻ semiconductorlayer 2. The dose of the p-type impurity of the ion implantation 54 cinto the n-type ion implantation layer 3 c is a dose larger than thedose of the n-type impurity of the ion implantation 53 c into the n⁻semiconductor layer 2 c when forming the n-type ion implantation layer 3c.

Next, the n⁻ semiconductor layer 2 d is epitaxially grown, withoutdoping, on the n⁻ semiconductor layer 2 c (FIG. 14( f)). Next, then-type ion implantation layers 3 a to 3 c and 15 a and the p-type ionimplantation layers 4 a to 4 c formed in the n⁻ semiconductor layers 2 ato 2 c are activated by heat treatment, thus diffusing the n-typeimpurity and p-type impurity ion implanted into each of the n⁻semiconductor layers 2 a to 2 c.

Because of this, each of the group of n-type ion implantation layers 3 ato 3 c and the group of p-type ion implantation layers 4 a to 4 c formedin the first region S1 of each of the n⁻ semiconductor layers 2 a to 2 cconnects in a vertical direction with respect to the main surface of then⁻ semiconductor layer 2, forming the n-layer 3 and p-layer 4respectively. Consequently, the parallel pn-layer 31 formed by then-layer 3 and p-layer 4 being repeatedly alternately disposed is formedin the first region S1 of the n⁻ semiconductor layer 2. Also, the n-typeion implantation layer 15 a formed in the second region S2 of the n⁻semiconductor layer 2 c diffuses inside the n⁻ semiconductor layers 2 cand 2 d, whereby the n-buried isolating layer 15 is formed across the n⁻semiconductor layers 2 c and 2 d (FIG. 15( g)).

The parallel pn-layer 31 formed in the first region S1 of the n⁻semiconductor layer 2 is of a super junction structure. It is preferablethat the parallel pn-layer 31 is formed so that the impurityconcentration thereof is practically equivalent to that of the n-layer 3and p-layer 4 configuring the parallel pn-layer 31. The reason for thisis as follows.

By the impurity concentration of the parallel pn-layer 31 beingpractically equivalent to that of the n-layer 3 and p-layer 4configuring the parallel pn-layer 31, a depletion layer spreadsthroughout the whole of the n-layer 3 and p-layer 4 when voltage isapplied. Because of this, by reducing the thickness of the parallelpn-layer 31 in comparison with when the drift layer is formed of onlythe n-layer, and increasing the impurity concentration of the n-layer 3in comparison with when the drift layer is formed of only the n-layer,it is possible to improve a trade-off between breakdown voltage andon-state voltage (on-state resistance).

The n-type impurity ion implanted into the second region S2 of the n⁻semiconductor layers 2 c and 2 d, by being activated, forms the n-buriedisolating layer 15 having an impurity concentration in the region of2×10¹⁵ cm⁻³ to 7×10¹⁵ cm⁻³. The n-type impurity and p-type impurity ionimplanted into each of the n⁻ semiconductor layers 2 a to 2 c alsodiffuse inside the n⁻ semiconductor layer 2 a, which is the bottommostlayer of the n⁻ semiconductor layer 2, and inside the n⁻ semiconductorlayer 2 d, which is the topmost layer of the n⁻ semiconductor layer 2.That is, the n-layer 3 and p-layer 4 are formed across the n⁻semiconductor layers 2 a to 2 d.

Next, the p-well region 5, n-drift region 6, n-source region 7,p-contact region 8, gate oxide film 9, gate electrode 10, inter layerdielectric 11, source electrode (not shown), and the like, of thevertical super junction MOSFET 101 are formed in the first region S1 ofthe n⁻ semiconductor layer 2 d, which is the topmost layer of the n⁻semiconductor layer 2. That is, the planar gate structure of thevertical super junction MOSFET 101 is formed. Also, the n-diffusedisolating layer 16 reaching the n-buried isolating layer 15 is formed inthe second region S2 of the n⁻ semiconductor layer 2 d.

Then, the p-well region 17, n-source region 18, n-drain region 19, gateoxide film 20, gate electrode 21, source electrode (not shown), drainelectrode (not shown), and the like, of the lateral MOSFET 102 areformed in a region of the n⁻ semiconductor layer 2 bounded by then-buried isolating layer 15 and n-diffused isolating layer 16. That is,the planar gate structure of the lateral MOSFET 102 is formed (FIG. 15(h)). Next, by the drain electrode 13 being formed on the rear surface ofthe n⁺ semiconductor layer 1, the semiconductor device 100 shown in FIG.1 is completed.

The n-diffused isolating layer 16 and each region of the lateral MOSFET102 formed in the second region S2 of the n⁻ semiconductor layer 2 d maybe formed at the same time as, for example, regions of the sameconductivity type of the vertical super junction MOSFET 101 formed inthe first region S1 of the n⁻ semiconductor layer 2 d (hereafter, inEmbodiments 14 to 20 too, in the same way, each region of the verticalsuper junction MOSFET and lateral MOSFET may be formed at the sametime).

By forming the n-buried isolating layer 15 and n-layer 3 at the sametime, as heretofore described, it is possible to reduce manufacturingcost.

The n-type impurity ion implantation 53 c for forming the n-buriedisolating layer 15 and the n-type impurity ion implantation 53 c forforming the n-layer 3 may be carried out separately, and the impuritydose for forming the n-buried isolating layer 15 may be larger than theimpurity dose for forming the n-layer 3. By carrying out the n-typeimpurity ion implantation 53 c for forming the n-buried isolating layer15 in this way, it is possible for the impurity concentration of then-buried isolating layer 15 to be higher than the impurity concentrationof the n-layer 3. Because of this, the lateral MOSFET 102 is less likelythan the lateral MOSFET of the semiconductor device 100 shown in FIG. 1to be adversely affected by drain voltage.

The manufacturing method of the semiconductor device 100 shown in FIG. 1is such that the thickness of the parallel pn-layer 31 can be increasedby repeatedly carrying out the steps of forming the n⁻ semiconductorlayer 2 b, the n-type ion implantation layer 3 b, and the p-type ionimplantation layer 4 b (the steps of FIG. 13( d)).

Also, the manufacturing method of the semiconductor device 100 shown inFIG. 1 is such that it is possible to fabricate the semiconductor device190 shown in FIG. 10 by forming the trench isolating structure 27 inplaces in which the n-diffused isolating layer 16 is formed. In thiscase, for example, the trench isolating structure 27 is formed by, afterforming the trench 27 a reaching the n-buried isolating layer 15 fromthe main surface 2 f of the n⁻ semiconductor layer 2, which is formed ofthe n⁻ semiconductor layers 2 a to 2 b, embedding polysilicon inside thetrench 27 a across the insulating film.

Although a description has been given of the manufacturing method of thesemiconductor device 100 shown in FIG. 1 with the n⁻ semiconductor layer2 having a configuration wherein the four n⁻ semiconductor layers 2 a to2 d are stacked as an example, the number of stacked layers configuringthe n⁻ semiconductor layer 2 is not limited to this.

As heretofore described, according to Embodiment 13, the n-type ionimplantation layer 15 a that forms the n-buried isolating layer 15 andthe n-type ion implantation layer 3 c that forms the n-layer 3 areformed simultaneously by the ion implantation 53 c into the n⁻semiconductor layer 2 c. Because of this, it is possible to form then-buried isolating layer 15 configuring the isolating structure thatelectrically isolates the vertical super junction MOSFET 101 and lateralMOSFET 102 in the step for forming the parallel pn-layer 31 of thevertical super junction MOSFET 101. Consequently, it is not necessary tocarry out a step solely for forming the n-buried isolating layer 15.Because of this, it is possible to reduce the manufacturing cost.

Embodiment 14

FIG. 16 to FIG. 18 are sectional views showing, in step order, asemiconductor device manufacturing method according to Embodiment 14 ofthe invention. In Embodiment 14, a description will be given of a methodof manufacturing the semiconductor device 110 according to Embodiment 2shown in FIG. 2. Firstly, a support substrate, which is to form the n⁺semiconductor layer 1, is prepared. The n⁺ semiconductor layer 1 formsthe n-drain layer of the vertical super junction MOSFET 111 (FIG. 16(a)).

Next, the n⁻ semiconductor layer 2 a is epitaxially grown to a thicknessof in the region of, for example, 7 μm, without doping, on the n⁺semiconductor layer 1. Next, the n-type impurity (for example,phosphorus or the like) ion implantation 53 a is selectively carried outin the first region S1, in which the vertical super junction MOSFET 111is formed, of the n⁻ semiconductor layer 2 a, forming a plurality ofn-type ion implantation layers 3 a in a surface layer of the firstregion S1 of the n⁻ semiconductor layer 2 a (FIG. 16( b)).

Next, the p-type impurity (for example, boron or the like) ionimplantation 54 a is selectively carried out adjacent to the n-type ionimplantation layers 3 a formed in the first region S1 of the n⁻semiconductor layer 2 a, forming a plurality of p-type ion implantationlayers 4 a in a surface layer of the first region S1 of the n⁻semiconductor layer 2 a (FIG. 16( c)). That is, the p-type ionimplantation layers 4 a are formed among the n-type ion implantationlayers 3 a formed in the first region S1 of the n⁻ semiconductor layer 2a, in such a way as to be in contact with the n-type ion implantationlayers 3 a.

Next, the n⁻ semiconductor layer 2 b is epitaxially grown to a thicknessof in the region of, for example, 7 μm, without doping, on the n⁻semiconductor layer 2 a. Next, the n-type impurity ion implantation 53 bis selectively carried out into regions of the n⁻ semiconductor layer 2b directly above the n-type ion implantation layers 3 a, forming aplurality of n-type ion implantation layers 3 b in a surface layer ofthe n⁻ semiconductor layer 2 b.

Then, the p-type impurity ion implantation 54 b is selectively carriedout into regions of the n⁻ ion implantation layer 2 b directly above thep-type ion implantation layers 4 a, forming a plurality of p-type ionimplantation layers 4 b in a surface layer of the n⁻ ion implantationlayer 2 b (FIG. 16( d)). Although a depiction is omitted from FIG. 16(d), the steps of forming the n⁻ semiconductor layer 2 b, the n-type ionimplantation layer 3 b, and the p-type ion implantation layer 4 b (thesteps of FIG. 16 (d)) are normally repeated in the region of six orseven times, increasing the thickness of the parallel pn-layer 31.

Next, the n⁻ semiconductor layer 2 c is epitaxially grown, withoutdoping, on the n⁻ semiconductor layer 2 b. Then, the n-type impurity ionimplantation 53 c is selectively carried into regions of the n⁻semiconductor layer 2 c directly above the n-type ion implantationlayers 3 b, and throughout the whole of the second region S2 of the n⁻semiconductor layer 2 c. By so doing, a plurality of n-type ionimplantation layers 3 c are formed in a surface layer of the firstregion S1 of the n⁻ semiconductor layer 2 c, and the n-type ionimplantation layer 15 a is formed in a surface layer of the secondregion S2 of the n⁻ semiconductor layer 2 c.

Next, the p-type impurity ion implantation 54 c is selectively carriedout into regions of the n⁻ semiconductor layer 2 c directly above thep-type ion implantation layers 4 b, forming a plurality of p-type ionimplantation layers 4 c in a surface layer of the first region S1 of then⁻ semiconductor layer 2 c (FIG. 17( e)). The n-type ion implantationlayers 3 a to 3 c are formed so as to be aligned in a vertical directionwith respect to a main surface of the semiconductor substrate formed ofthe n⁻ semiconductor layers 2 a to 2 c configuring the n⁻ semiconductorlayer 2. The p-type ion implantation layers 4 a to 4 c are formed so asto be aligned in a vertical direction with respect to a main surface ofthe semiconductor substrate formed of the n⁻ semiconductor layers 2 a to2 c configuring the n⁻ semiconductor layer 2.

Next, the n⁻ semiconductor layer 2 d is epitaxially grown, withoutdoping, on the n⁻ semiconductor layer 2 c (FIG. 17( f)). Next, then-type ion implantation layers 3 a to 3 c and 15 a and the p-type ionimplantation layers 4 a to 4 c formed in the n⁻ semiconductor layers 2 ato 2 c are activated by heat treatment, thus diffusing the n-typeimpurity and p-type impurity ion implanted into each of the n⁻semiconductor layers 2 a to 2 c.

Because of this, each of the group of n-type ion implantation layers 3 ato 3 c and the group of p-type ion implantation layers 4 a to 4 c formedin the first region S1 of each of the n⁻ semiconductor layers 2 a to 2 cconnects in a vertical direction with respect to the main surface of then⁻ semiconductor layer 2, forming the n-layer 3 and p-layer 4respectively. Consequently, the parallel pn-layer 31 formed by then-layer 3 and p-layer 4 being repeatedly alternately disposed is formedin the first region S1 of the n⁻ semiconductor layer 2. Also, the n-typeion implantation layer 15 a formed in the second region S2 of the n⁻semiconductor layer 2 c diffuses inside the n⁻ semiconductor layers 2 cand 2 d, whereby the n-buried isolating layer 15 is formed across the n⁻semiconductor layers 2 c and 2 d.

The parallel pn-layer 31 formed in the first region S1 of the n⁻semiconductor layer 2 is of a super junction structure. It is preferablethat the parallel pn-layer 31 is formed so that the impurityconcentration thereof is practically equivalent to that of the n-layer 3and p-layer 4 configuring the parallel pn-layer 31. The reason for thisis as follows. By the impurity concentration of the parallel pn-layer 31being practically equivalent to that of the n-layer 3 and p-layer 4configuring the parallel pn-layer 31, a depletion layer spreadsthroughout the whole of the n-layer 3 and p-layer 4 when voltage isapplied. Because of this, by reducing the thickness of the parallelpn-layer 31 in comparison with when the drift layer is formed of onlythe n-layer, and increasing the impurity concentration of the n-layer 3in comparison with when the drift layer is formed of only the n-layer,it is possible to improve the trade-off between breakdown voltage andon-state voltage (on-state resistance).

Also, the n-type impurity ion implanted into the second region S2 of then⁻ semiconductor layers 2 c and 2 d, by being activated, forms then-buried isolating layer 15. The n-type impurity and p-type impurity ionimplanted into each of the n⁻ semiconductor layers 2 a to 2 c alsodiffuse inside the n⁻ semiconductor layer 2 a, which is the bottommostlayer of the n⁻ semiconductor layer 2, and inside the n⁻ semiconductorlayer 2 d, which is the topmost layer of the n⁻ semiconductor layer 2.That is, the n-layer 3 and p-layer 4 are formed across the n⁻semiconductor layers 2 a to 2 d (FIG. 18( g)).

Next, the p-well region 5, n-drift region 6, n-source region 7,p-contact region 8, gate oxide film 9, gate electrode 10, sourceelectrode (not shown), and the like, of the vertical super junctionMOSFET 111 are formed in the first region S1 of the n⁻ semiconductorlayer 2 d, which is the topmost layer. That is, the planar gatestructure of the vertical super junction MOSFET 111 is formed. Also, then-diffused isolating layer 16 reaching the n-buried isolating layer 15is formed in the second region S2 of the n⁻ semiconductor layer 2 d.

Then, the p-well region 17, n-source region 18, n-drain region 19, gateoxide film 20, gate electrode 21, source electrode (not shown), drainelectrode (not shown), and the like, of the lateral MOSFET 112 areformed in a region of the n⁻ semiconductor layer 2 bounded by then-buried isolating layer 15 and n-diffused isolating layer 16. That is,the planar gate structure of the lateral MOSFET 112 is formed (FIG. 18(h)). Next, by the drain electrode 13 being formed on the rear surface ofthe n⁺ semiconductor layer 1, the semiconductor device 110 shown in FIG.2 is completed.

By forming the n-buried isolating layer 15 and n-layer 3 at the sametime, as heretofore described, it is possible to reduce manufacturingcost.

Also, as the n-layer 3 and p-layer 4 formed in the first region S1 areeach selectively formed, it is possible to set the impurityconcentration as desired, improving the freedom of design.

The n-type impurity ion implantation 53 c for forming the n-buriedisolating layer 15 and the ion implantation for forming the n-layer 3may be carried out separately, and the impurity dose for forming then-buried isolating layer 15 may be larger than the impurity dose forforming the n-layer 3. By carrying out the ion implantation 53 c forforming the n-buried isolating layer 15 in this way, it is possible forthe impurity concentration of the n-buried isolating layer 15 to behigher than the impurity concentration of the n-layer 3. Because ofthis, the lateral MOSFET 112 is less likely than the lateral MOSFET ofthe semiconductor device 100 shown in FIG. 1 to be adversely affected bydrain voltage.

Also, the manufacturing method of the semiconductor device 110 shown inFIG. 2 is such that it is possible to fabricate the semiconductor device190 shown in FIG. 10 by forming the trench isolating structure 27 inplaces in which the n-diffused isolating layer 16 is formed. In thiscase, for example, the trench isolating structure 27 is formed by, afterforming the trench 27 a reaching the n-buried isolating layer 15 fromthe main surface 2 f of the n⁻ semiconductor layer 2, which is formed ofthe n⁻ semiconductor layers 2 a to 2 b, embedding polysilicon inside thetrench 27 a across the insulating film.

Although a description has been given of the manufacturing method of thesemiconductor device 110 shown in FIG. 2 with the n⁻ semiconductor layer2 having a configuration wherein the four n⁻ semiconductor layers 2 a to2 d are stacked as an example, the number of stacked layers configuringthe n⁻ semiconductor layer 2 is not limited to this.

As heretofore described, according to Embodiment 14, it is possible toobtain the same advantages as with the semiconductor devicemanufacturing method according to Embodiment 13. That is, the number ofstacked layers configuring the n⁻ semiconductor layer 2 may be less thanfour, and may be more than four.

Embodiment 15

FIG. 19 to FIG. 21 are sectional views showing, in step order, asemiconductor device manufacturing method according to Embodiment 15 ofthe invention. In Embodiment 15, a description will be given of a methodof manufacturing the semiconductor device 120 according to Embodiment 3shown in FIG. 3. Firstly, a support substrate, which is to form the n⁺semiconductor layer 1, is prepared. The n⁺ semiconductor layer 1 formsthe n-drain layer of the vertical super junction MOSFET 121 (FIG. 19(a)).

Next, the n⁻ semiconductor layer 2 a is epitaxially grown to a thicknessof in the region of, for example, 7 μm, without doping, on the n⁺semiconductor layer 1. Next, the n-type impurity (for example,phosphorus or the like) ion implantation 53 a is carried out throughoutthe whole of the n⁻ semiconductor layer 2 a, including the first regionS1 in which the vertical super junction MOSFET 121 is formed and thesecond region S2 in which the n-buried isolating layer 15 is formed. Byso doing, the n-type ion implantation layer 3 a is formed in a surfacelayer of the n⁻ semiconductor layer 2 a over the whole of the n⁻semiconductor layer 2 a (FIG. 19( b)).

Next, the p-type impurity (for example, boron or the like) ionimplantation 54 a is selectively carried out into the n-type ionimplantation layer 3 a on the first region S1 side of the n⁻semiconductor layer 2 a, forming a plurality of p-type ion implantationlayers 4 a in a surface layer of the n-type ion implantation layer 3 aon the first region S1 side of the n⁻ semiconductor layer 2 a (FIG. 19(c)). The dose of the p-type impurity of the ion implantation 54 a intothe n-type ion implantation layer 3 a is a dose larger than the dose ofthe n-type impurity of the ion implantation 53 a into the n⁻semiconductor layer 2 a when forming the n-type ion implantation layer 3a.

Next, the n⁻ semiconductor layer 2 b is epitaxially grown to a thicknessof in the region of, for example, 7 μm, without doping, on the n⁻semiconductor layer 2 a. Next, the n-type impurity ion implantation 53 bis carried out throughout the whole of the n⁻ semiconductor layer 2 b,including the first region S1 and the second region S2. By so doing, then-type ion implantation layer 3 b is formed in a surface layer of the n⁻semiconductor layer 2 b over the whole of the n⁻ semiconductor layer 2b. Then, the p-type impurity ion implantation 54 b is selectivelycarried out into regions of the n-type ion implantation layer 3 bdirectly above the p-type ion implantation layers 4 a, forming aplurality of p-type ion implantation layers 4 b in a surface layer ofthe n-type ion implantation layer 3 b (FIG. 19( d)).

The dose of the p-type impurity of the ion implantation 54 b into then-type ion implantation layer 3 b is a dose larger than the dose of then-type impurity of the ion implantation 53 b into the n⁻ semiconductorlayer 2 b when forming the n-type ion implantation layer 3 b. Although adepiction is omitted from FIG. 19( d), the steps of forming the n⁻semiconductor layer 2 b, the n-type ion implantation layer 3 b, and thep-type ion implantation layer 4 b (the steps of FIG. 19 (d)) arenormally repeated in the region of six or seven times, increasing thethickness of the parallel pn-layer 31 after completion.

Next, the n⁻ semiconductor layer 2 c is epitaxially grown to a thicknessof in the region of, for example, 7 μm, without doping, on the n⁻semiconductor layer 2 b. Next, the n-type impurity ion implantation 53 cis carried out throughout the whole of the n⁻ semiconductor layer 2 c,including the first region S1 and the second region S2. By so doing, then-type ion implantation layer 3 c is formed in a surface layer of the n⁻semiconductor layer 2 c over the whole of the n⁻ semiconductor layer 2c. Then, the p-type impurity ion implantation 54 c is selectivelycarried out into regions of the n-type ion implantation layer 3 cdirectly above the p-type ion implantation layers 4 b, forming aplurality of p-type ion implantation layers 4 c in a surface layer ofthe n-type ion implantation layer 3 c (FIG. 20( e)).

The p-type ion implantation layers 4 a to 4 c are formed so as to bealigned in a vertical direction with respect to a main surface of thesemiconductor substrate formed of the n⁻ semiconductor layers 2 a to 2 cconfiguring the n⁻ semiconductor layer 2. The dose of the p-typeimpurity of the ion implantation 54 c into the n-type ion implantationlayer 3 c is a dose larger than the dose of the n-type impurity of theion implantation 53 c into the n⁻ semiconductor layer 2 c when formingthe n-type ion implantation layer 3 c.

Next, the n⁻ semiconductor layer 2 d is epitaxially grown, withoutdoping, on the n⁻ semiconductor layer 2 c (FIG. 20( f)). Next, then-type ion implantation layers 3 a to 3 c and the p-type ionimplantation layers 4 a to 4 c formed in the n⁻ semiconductor layers 2 ato 2 c are activated by heat treatment, thus diffusing the n-typeimpurity and p-type impurity ion implanted into each of the n⁻semiconductor layers 2 a to 2 c.

Because of this, each of the group of n-type ion implantation layers 3 ato 3 c and the group of p-type ion implantation layers 4 a to 4 c formedin the first region S1 of each of the n⁻ semiconductor layers 2 a to 2 cconnects in a vertical direction with respect to the main surface of then⁻ semiconductor layer 2, forming the n-layer 3 and p-layer 4respectively. Consequently, the parallel pn-layer 31 formed by then-layer 3 and p-layer 4 being repeatedly alternately disposed is formedin the first region S1 of the n⁻ semiconductor layer 2. Also, in thesecond region S2 of the n⁻ semiconductor layer 2 too, the group ofn-type ion implantation layers 3 a to 3 c connects in a verticaldirection with respect to the main surface of the n⁻ semiconductor layer2, forming the n-layer 3.

The parallel pn-layer 31 formed in the first region S1 of the n⁻semiconductor layer 2 is of a super junction structure. It is preferablethat the parallel pn-layer 31 is formed so that the impurityconcentration thereof is practically equivalent to that of the n-layer 3and p-layer 4 configuring the parallel pn-layer 31. The reason for thisis as follows. By the impurity concentration of the parallel pn-layer 31being practically equivalent to that of the n-layer 3 and p-layer 4configuring the parallel pn-layer 31, a depletion layer spreadsthroughout the whole of the n-layer 3 and p-layer 4 when voltage isapplied. Because of this, by reducing the thickness of the parallelpn-layer 31 in comparison with when the drift layer is formed of onlythe n-layer, and increasing the impurity concentration of the n-layer 3in comparison with when the drift layer is formed of only the n-layer,it is possible to improve the trade-off between breakdown voltage andon-state voltage (on-state resistance).

Meanwhile, the n-layer 3 formed in the second region S2 of the n⁻semiconductor layers 2 a to 2 c forms a thick n-buried isolating layerhaving the same thickness as that of the parallel pn-layer 31. Then-type impurity and p-type impurity ion implanted into each of the n⁻semiconductor layers 2 a to 2 c also diffuse inside the n⁻ semiconductorlayer 2 a, which is the bottommost layer of the n⁻ semiconductor layer2, and inside the n⁻ semiconductor layer 2 d, which is the topmost layerof the n⁻ semiconductor layer 2. That is, the n-layer 3 and p-layer 4are formed across the n⁻ semiconductor layers 2 a to 2 d (FIG. 21( g)).

Next, the p-well region 5, n-drift region 6, n-source region 7,p-contact region 8, gate oxide film 9, gate electrode 10, sourceelectrode (not shown), and the like, of the vertical super junctionMOSFET 121 are formed in the first region S1 of the n⁻ semiconductorlayer 2 d, which is the topmost layer. That is, the planar gatestructure of the vertical super junction MOSFET 121 is formed. Also, then-diffused isolating layer 16 reaching the n-layer 3 is formed in thesecond region S2 of the n⁻ semiconductor layer 2 d.

Then, the p-well region 17, n-source region 18, n-drain region 19, gateoxide film 20, gate electrode 21, source electrode (not shown), drainelectrode (not shown), and the like, of the lateral MOSFET 122 areformed in a region of the n⁻ semiconductor layer 2 bounded by then-layer 3, which forms an n-buried isolating layer, and the n-diffusedisolating layer 16. That is, the planar gate structure of the lateralMOSFET 122 is formed (FIG. 21( h)). Next, by the drain electrode 13being formed on the rear surface of the n⁺ semiconductor layer 1, thesemiconductor device 120 shown in FIG. 3 is completed.

As heretofore described, by forming an n-buried isolating layer with then-layer 3, and integrally forming the n-buried isolating layer and then-layer 3 configuring the parallel pn-layer 31, it is possible to form athick n-buried isolating layer having the same thickness as that of theparallel pn-layer 31. By so doing, it is possible to attempt to suppressmalfunction of the parasitic transistor, and reduce leakage current in apn-junction portion of the parasitic transistor.

Also, it is preferable that the n⁻ semiconductor layer 2 d, which is thetopmost layer of the n⁻ semiconductor layer 2 and in which the p-wellregion and n-source region are formed, is formed more thickly than then⁻ semiconductor layer 2 a, which is the bottommost layer of the n⁻semiconductor layer 2.

As heretofore described, according to Embodiment 15, it is possible toobtain the same advantages as with the semiconductor devicemanufacturing method according to Embodiment 13.

Embodiment 16

FIG. 22 to FIG. 24 are sectional views showing, in step order, asemiconductor device manufacturing method according to Embodiment 16 ofthe invention. In Embodiment 16, a description will be given of a methodof manufacturing the semiconductor device 130 according to Embodiment 4shown in FIG. 4. Firstly, the n⁺ semiconductor layer 1 is prepared. Then⁺ semiconductor layer 1 forms the n-drain layer of the vertical superjunction MOSFET 131 (FIG. 22( a)).

Next, the n⁻ semiconductor layer 2 a is epitaxially grown to a thicknessof in the region of, for example, 7 μm, without doping, on the n⁺semiconductor layer 1. Next, the n-type impurity (for example,phosphorus or the like) ion implantation 53 a is carried out throughoutthe whole of the first region S1, in which the vertical super junctionMOSFET 131 is formed, of the n⁻ semiconductor layer 2 a, forming then-type ion implantation layer 3 a in a surface layer of the first regionS1 of the n⁻ semiconductor layer 2 a (FIG. 22( b)).

Next, the p-type impurity (for example, boron or the like) ionimplantation 54 a is selectively carried out into the n-type ionimplantation layer 3 a, forming a plurality of p-type ion implantationlayers 4 a in a surface layer of the n-type ion implantation layer 3 a(FIG. 22( c)). The dose of the p-type impurity of the ion implantation54 a into the n-type ion implantation layer 3 a is a dose larger thanthe dose of the n-type impurity of the ion implantation 53 a into the n⁻semiconductor layer 2 a when forming the n-type ion implantation layer 3a.

Next, the n⁻ semiconductor layer 2 b is epitaxially grown to a thicknessof in the region of, for example, 7 μm, without doping, on the n⁻semiconductor layer 2 a. Next, the n-type impurity ion implantation 53 bis carried out throughout the whole of the first region S1 of the n⁻semiconductor layer 2 b, forming the n-type ion implantation layer 3 bin a surface layer of the first region S1 of the n⁻ semiconductor layer2 b. Then, the p-type impurity ion implantation 54 b is selectivelycarried out into regions of the n-type ion implantation layer 3 bdirectly above the p-type ion implantation layers 4 a, forming aplurality of p-type ion implantation layers 4 b in a surface layer ofthe n-type ion implantation layer 3 b (FIG. 22( d)).

The dose of the p-type impurity of the ion implantation 54 b into then-type ion implantation layer 3 b is a dose larger than the dose of then-type impurity of the ion implantation 53 b into the n⁻ semiconductorlayer 2 b when forming the n-type ion implantation layer 3 b. Although adepiction is omitted from FIG. 22( d), the steps of forming the n⁻semiconductor layer 2 b, the n-type ion implantation layer 3 b, and thep-type ion implantation layer 4 b (the steps of FIG. 22 (d)) arenormally repeated in the region of six or seven times, increasing thethickness of the parallel pn-layer 31 after completion.

Next, the n⁻ semiconductor layer 2 c is epitaxially grown, withoutdoping, on the n⁻ semiconductor layer 2 b. Next, the n-type impurity ionimplantation 53 c is carried out throughout the whole of the firstregion S1 of the n⁻ semiconductor layer 2 c. By so doing, the n-type ionimplantation layer 3 c is formed in a surface layer of the n⁻semiconductor layer 2 c across the whole of the first region S1 of then⁻ semiconductor layer 2 c.

Then, the p-type impurity ion implantation 54 c is carried out intoregions of the n-type ion implantation layer 3 c directly above thep-type ion implantation layers 4 b, and throughout the whole of thesecond region S2 of the n⁻ semiconductor layer 2 c. Because of this, aplurality of p-type ion implantation layers 4 c are formed in a surfacelayer of the n-type ion implantation layer 3 c, and a p-type ionimplantation layer 24 a is formed in a surface layer of the secondregion S2 of the n⁻ semiconductor layer 2 c (FIG. 23( e)). The dose ofthe p-type impurity of the ion implantation 54 c into the n-type ionimplantation layer 3 c and n⁻ semiconductor layer 2 c is a dose largerthan the dose of the n-type impurity of the ion implantation 53 c intothe n⁻ semiconductor layer 2 c when forming the n-type ion implantationlayer 3 c.

Next, the n⁻ semiconductor layer 2 d is epitaxially grown, withoutdoping, on the n⁻ semiconductor layer 2 c (FIG. 23( f)). Next, then-type ion implantation layers 3 a to 3 c and the p-type ionimplantation layers 4 a to 4 c and 24 a formed in the n⁻ semiconductorlayers 2 a to 2 c are activated by heat treatment, thus diffusing then-type impurity and p-type impurity ion implanted into each of the n⁻semiconductor layers 2 a to 2 c.

Because of this, each of the group of n-type ion implantation layers 3 ato 3 c and the group of p-type ion implantation layers 4 a to 4 c formedin the first region S1 of each of the n⁻ semiconductor layers 2 a to 2 cconnects in a vertical direction with respect to the main surface of then⁻ semiconductor layer 2, forming the n-layer 3 and p-layer 4respectively. Consequently, the parallel pn-layer 31 formed by then-layer 3 and p-layer 4 being repeatedly alternately disposed is formedin the first region S1 of the n⁻ semiconductor layer 2. Also, the p-typeion implantation layer 24 a formed in the second region S2 of the n⁻semiconductor layer 2 c diffuses inside the n⁻ semiconductor layers 2 cand 2 d, whereby the p-buried isolating layer 24 is formed across the n⁻semiconductor layers 2 c and 2 d.

The parallel pn-layer 31 formed in the first region S1 of the n⁻semiconductor layer 2 is of a super junction structure. It is preferablethat the parallel pn-layer 31 is formed so that the impurityconcentration thereof is practically equivalent to that of the n-layer 3and p-layer 4 configuring the parallel pn-layer 31. The reason for thisis as follows. By the impurity concentration of the parallel pn-layer 31being practically equivalent to that of the n-layer 3 and p-layer 4configuring the parallel pn-layer 31, a depletion layer spreadsthroughout the whole of the n-layer 3 and p-layer 4 when voltage isapplied. Because of this, by reducing the thickness of the parallelpn-layer 31 in comparison with when the drift layer is formed of onlythe n-layer, and increasing the impurity concentration of the n-layer 3in comparison with when the drift layer is formed of only the n-layer,it is possible to improve the trade-off between breakdown voltage andon-state voltage (on-state resistance).

The n-type impurity and p-type impurity ion implanted into each of then⁻ semiconductor layers 2 a to 2 c also diffuse inside the n⁻semiconductor layer 2 a, which is the bottommost layer, and inside then⁻ semiconductor layer 2 d, which is the topmost layer. That is, then-layer 3 and p-layer 4 are formed across the n⁻ semiconductor layers 2a to 2 d (FIG. 24( g)).

Next, the p-well region 5, n-drift region 6, n-source region 7,p-contact region 8, gate oxide film 9, gate electrode 10, inter layerdielectric 11, source electrode (not shown), and the like, of thevertical super junction MOSFET 131 are formed in the first region S1 ofthe n⁻ semiconductor layer 2 d, which is the topmost layer. That is, theplanar gate structure of the vertical super junction MOSFET 131 isformed. Also, the p-diffused isolating layer 25 reaching the p-buriedisolating layer 24 is formed in the second region S2 of the n⁻semiconductor layer 2 d.

Then, the p-well region 17, n-source region 18, n-drain region 19, gateoxide film 20, gate electrode 21, source electrode (not shown), drainelectrode (not shown), and the like, of the lateral MOSFET 132 areformed in the n⁻ semiconductor layer 2 bounded by the p-buried isolatinglayer 24 and n-diffused isolating layer 16 of the n⁻ semiconductor layer2. That is, the planar gate structure of the lateral MOSFET 132 isformed (FIG. 24( h)). Next, by the drain electrode 13 being formed onthe rear surface of the n⁺ semiconductor layer 1, the semiconductordevice 130 shown in FIG. 4 is completed.

As heretofore described, the p-type ion implantation layer 24 a thatforms the p-buried isolating layer 24 and the p-type ion implantationlayer 4 c that forms the p-layer 4 are formed simultaneously by the ionimplantation 54 c when forming the p-type ion implantation layer 4 cthat forms the p-layer 4. Because of this, it is possible to form thep-buried isolating layer 24 and p-layer 4 simultaneously, and thuspossible to reduce manufacturing cost in the same way as with thesemiconductor device manufacturing method according to Embodiment 13.

Also, the p-type impurity ion implantation 54 c for forming the p-buriedisolating layer 24 and the ion implantation 54 c for forming the p-layer4 may be carried out separately, and the impurity dose for forming thep-buried isolating layer 24 may be larger than the impurity dose forforming the p-layer 4. By carrying out the ion implantation 54 c forforming the p-buried isolating layer 24 in this way, it is possible forthe impurity concentration of the p-buried isolating layer 24 to behigher than the impurity concentration of the p-layer 4. Because ofthis, it is possible to increase the advantages of suppressingmalfunction of the parasitic transistor and reducing leakage current inthe pn-junction portion of the parasitic transistor.

As heretofore described, according to Embodiment 16, it is possible toobtain the same advantages as with the semiconductor devicemanufacturing method according to Embodiment 13.

Embodiment 17

FIG. 25 is a sectional view showing a semiconductor device manufacturingmethod according to Embodiment 17 of the invention. In Embodiment 17, adescription will be given of a method of manufacturing the semiconductordevice 140 according to Embodiment 5 shown in FIG. 5.

Firstly, the semiconductor device manufacturing method according toEmbodiment 13 is carried out as far as the step of diffusing the n-typeimpurity and p-type impurity by heat treatment, thereby forming theparallel pn-layer 31 and n-buried isolating layer 15 (refer to FIG. 13(a) to FIG. 15( g)).

Next, continuing from the step of forming the parallel pn-layer 31 andn-buried isolating layer 15 (the step of FIG. 15( g)), the p-well region5, n-drift region 6, n-source region 7, p-contact region 8, gate oxidefilm 9, gate electrode 10, inter layer dielectric 11, source electrode(not shown), and the like, of the vertical super junction MOSFET 141 areformed in the first region S1 of the n⁻ semiconductor layer 2 d, whichis the topmost layer of the n⁻ semiconductor layer 2. That is, theplanar gate structure of the vertical super junction MOSFET 141 isformed. Also, the n-diffused isolating layer 16 reaching the n-buriedisolating layer 15 is formed in the second region S2 of the n⁻semiconductor layer 2 d.

Then, the p-source region 18 a, p-drain region 19 a, gate oxide film 20,gate electrode 21, source electrode (not shown), drain electrode, andthe like, of the lateral MOSFET 142 are formed, with the n⁻semiconductor layer 2 bounded by the n-buried isolating layer 15 andn-diffused isolating layer 16 of the n⁻ semiconductor layer 2 as ann-well region. That is, the planar gate structure of the lateral MOSFET142 is formed (FIG. 25). Next, by the drain electrode 13 being formed onthe rear surface of the n⁺ semiconductor layer 1, the semiconductordevice 140 shown in FIG. 5 is completed.

As heretofore described, according to Embodiment 17, it is possible toobtain the same advantages as with the semiconductor devicemanufacturing method according to Embodiment 13.

Embodiment 18

FIG. 26 and FIG. 27 are sectional views showing, in step order, asemiconductor device manufacturing method according to Embodiment 18 ofthe invention. In Embodiment 18, a description will be given of a methodof manufacturing the semiconductor device according to Embodiment 7shown in FIG. 7.

Firstly, the semiconductor device manufacturing method according toEmbodiment 13 is carried out as far as the step of forming the n⁻semiconductor layer 2 d (refer to FIG. 13( a) to FIG. 14( f)). Next,continuing from the step of forming the n⁻ semiconductor layer 2 d (thestep of FIG. 14( f)), an n-type impurity ion implantation 53 d iscarried out throughout the whole of the first region S1 of the n⁻semiconductor layer 2 d, and into a region of the second region S2 ofthe n⁻ semiconductor layer 2 d in which the n-layer 26 is to be formed.

The ion implantation 53 d into the second region S2 of the n⁻semiconductor layer 2 d is, for example, carried out into a regioncorresponding to an outer peripheral portion of the n-type ionimplantation layer 15 a provided in a surface layer of the n⁻semiconductor layer 2 c. Because of this, an n-type ion implantationlayer 3 d is formed in a surface layer of the first region S1 of the n⁻semiconductor layer 2 d, and an n-type ion implantation layer 26 a isselectively formed in the second region S2 of the n⁻ semiconductor layer2 d.

Then, a p-type impurity ion implantation 54 d is selectively carried outinto regions of the n-type ion implantation layer 3 d directly above thep-type ion implantation layers 4 c, forming a plurality of p-type ionimplantation layers 4 d in a surface layer of the n-type ionimplantation layer 3 d (FIG. 26( a)). The dose of the p-type impurity ofthe ion implantation 54 d into the n-type ion implantation layer 3 d isa dose larger than the dose of the n-type impurity of the ionimplantation 53 d into the n⁻ semiconductor layer 2 d when forming then-type ion implantation layer 3 d.

Next, an n⁻ semiconductor layer 2 e is epitaxially grown, withoutdoping, on the n⁻ semiconductor layer 2 d (FIG. 26( b)). Next, then-type ion implantation layers 3 a to 3 d, 15 a, and 26 a and the p-typeion implantation layers 4 a to 4 d formed in the n⁻ semiconductor layers2 a to 2 d are activated by heat treatment, thus diffusing the n-typeimpurity and p-type impurity ion implanted into each of the n⁻semiconductor layers 2 a to 2 d (FIG. 27( c)).

Because of this, each of the group of n-type ion implantation layers 3 ato 3 d and the group of p-type ion implantation layers 4 a to 4 d formedin the first region S1 of each of the n⁻ semiconductor layers 2 a to 2 dconnects in a vertical direction with respect to the main surface of then⁻ semiconductor layer 2, forming the n-layer 3 and p-layer 4respectively. Consequently, the parallel pn-layer 31 formed by then-layer 3 and p-layer 4 being repeatedly alternately disposed is formedin the first region S1 of the n⁻ semiconductor layer 2.

The parallel pn-layer 31 formed in the first region S1 of the n⁻semiconductor layer 2 is of a super junction structure. It is preferablethat the parallel pn-layer 31 is formed so that the impurityconcentration thereof is practically equivalent to that of the n-layer 3and p-layer 4 configuring the parallel pn-layer 31. The reason for thisis as follows. By the impurity concentration of the parallel pn-layer 31being practically equivalent to that of the n-layer 3 and p-layer 4configuring the parallel pn-layer 31, a depletion layer spreadsthroughout the whole of the n-layer 3 and p-layer 4 when voltage isapplied. Because of this, by reducing the thickness of the parallelpn-layer 31 in comparison with when the drift layer is formed of onlythe n-layer, and increasing the impurity concentration of the n-layer 3in comparison with when the drift layer is formed of only the n-layer,it is possible to improve the trade-off between breakdown voltage andon-state voltage (on-state resistance).

Also, owing to the heat treatment by which the parallel pn-layer 31 isformed, the n-type ion implantation layer 15 a formed in the secondregion S2 of the n⁻ semiconductor layer 2 c diffuses inside the n⁻semiconductor layers 2 c and 2 d, whereby the n-buried isolating layer15 is formed across the n⁻ semiconductor layers 2 c and 2 d.Furthermore, the n-type ion implantation layer 26 a formed in the secondregion S2 of the n⁻ semiconductor layer 2 d is activated, therebyforming the n-buried isolating layer 15 and the n-layer 26 in contactwith an outer peripheral portion of the n-buried isolating layer 15.

The n-type impurity and p-type impurity ion implanted into each of then⁻ semiconductor layers 2 a to 2 d also diffuse to the n⁻ semiconductorlayer 2 a, which is the bottommost layer of the n⁻ semiconductor layer2, and to the n⁻ semiconductor layer 2 e, which is the topmost layer ofthe n⁻ semiconductor layer 2. That is, the n-layer 3 and p-layer 4 areformed across the n⁻ semiconductor layers 2 a to 2 d.

Next, the p-well region 5, n-drift region 6, n-source region 7,p-contact region 8, gate oxide film 9, gate electrode 10, inter layerdielectric 11, source electrode (not shown), and the like, of thevertical super junction MOSFET 161 are formed in the first region S1 ofthe n⁻ semiconductor layer 2 e, which is the topmost layer of the n⁻semiconductor layer 2. That is, the planar gate structure of thevertical super junction MOSFET 161 is formed. Also, the n-diffusedisolating layer 16 in contact with the n-layer 26 is formed in thesecond region S2 of the n⁻ semiconductor layer 2 e.

Then, the p-well region 17, n-source region 18, n-drain region 19, gateoxide film 20, gate electrode 21, source electrode (not shown), drainelectrode (not shown), and the like, of the lateral MOSFET 162 areformed in a region of the n⁻ semiconductor layer 2 bounded by then-layer 26, n-buried isolating layer 15, and n-diffused isolating layer16. That is, the planar gate structure of the lateral MOSFET 162 isformed (FIG. 27( d)). Next, by the drain electrode 13 being formed onthe rear surface of the n⁺ semiconductor layer 1, the semiconductordevice 160 shown in FIG. 7 is completed.

As heretofore described, according to Embodiment 18, it is possible toobtain the same advantages as with the semiconductor devicemanufacturing method according to Embodiment 13.

Embodiment 19

FIG. 28 and FIG. 29 are sectional views showing, in step order, asemiconductor device manufacturing method according to Embodiment 19 ofthe invention. In Embodiment 19, a description will be given of a methodof manufacturing the semiconductor device 170 according to Embodiment 8shown in FIG. 8.

Firstly, the semiconductor device manufacturing method according toEmbodiment 13 is carried out as far as the step of forming the n⁻semiconductor layer 2 d (refer to FIG. 13( a) to FIG. 14( f)). Next,continuing from the step of forming the n⁻ semiconductor layer 2 d (thestep of FIG. 14( f)), the n-type impurity ion implantation 53 d iscarried out throughout the whole of the first region S1 of the n⁻semiconductor layer 2 d, and throughout the whole of the second regionS2, in which the n-buried isolating layer 15 is to be formed. Because ofthis, the n-type ion implantation layer 3 d is formed in a surface layerof the first region S1 of the n⁻ semiconductor layer 2 d, and an n-typeion implantation layer 15 b is formed in a surface layer of the secondregion S2 of the n⁻ semiconductor layer 2 d.

Then, the p-type impurity ion implantation 54 d is selectively carriedout into regions of the n-type ion implantation layer 3 d directly abovethe p-type ion implantation layers 4 c, forming a plurality of p-typeion implantation layers 4 d in a surface layer of the n-type ionimplantation layer 3 d (FIG. 28( a)). The p-type ion implantation layers4 a to 4 d are formed so as to be aligned in a vertical direction withrespect to a main surface of the semiconductor substrate formed of then⁻ semiconductor layers 2 a to 2 c configuring the n⁻ semiconductorlayer 2. The dose of the p-type impurity of the ion implantation 54 dinto the n-type ion implantation layer 3 d is a dose larger than thedose of the n-type impurity of the ion implantation 53 d into the n⁻semiconductor layer 2 d when forming the n-type ion implantation layer 3d.

Next, the n⁻ semiconductor layer 2 e is epitaxially grown, withoutdoping, on the n⁻ semiconductor layer 2 d (FIG. 28( b)). Next, then-type ion implantation layers 3 a to 3 d, 15 a, and 15 b and the p-typeion implantation layers 4 a to 4 d formed in the n⁻ semiconductor layers2 a to 2 d are activated by heat treatment, thus diffusing the n-typeimpurity and p-type impurity ion implanted into each of the n⁻semiconductor layers 2 a to 2 d.

Because of this, each of the group of n-type ion implantation layers 3 ato 3 d and the group of p-type ion implantation layers 4 a to 4 d formedin the first region S1 of each of the n⁻ semiconductor layers 2 a to 2 dconnects in a vertical direction with respect to the main surface of then⁻ semiconductor layer 2, forming the n-layer 3 and p-layer 4respectively. Consequently, the parallel pn-layer 31 formed by then-layer 3 and p-layer 4 being repeatedly alternately disposed is formedin the first region S1 of the n⁻ semiconductor layer 2.

Also, the n-type ion implantation layers 15 a and 15 b formed in thesecond region S2 of the n⁻ semiconductor layers 2 c and 2 d diffuse andconnect inside the n⁻ semiconductor layers 2 c to 2 e, whereby then-buried isolating layer 15 is formed across the n⁻ semiconductor layers2 c to 2 e (FIG. 29( c)). The n-type impurity and p-type impurity ionimplanted into each of the n⁻ semiconductor layers 2 a to 2 d alsodiffuse to the n⁻ semiconductor layer 2 a, which is the bottommost layerof the n⁻ semiconductor layer 2, and to the n⁻ semiconductor layer 2 e,which is the topmost layer of the n⁻ semiconductor layer 2. That is, then-layer 3 and p-layer 4 are formed across the n⁻ semiconductor layers 2a to 2 e.

Next, the p-well region 5, n-drift region 6, n-source region 7,p-contact region 8, gate oxide film 9, gate electrode 10, inter layerdielectric 11, source electrode (not shown), and the like, of thevertical super junction MOSFET 171 are formed in the first region S1 ofthe n⁻ semiconductor layer 2 e, which is the topmost layer of the n⁻semiconductor layer 2. That is, the planar gate structure of thevertical super junction MOSFET 171 is formed. Also, the n-diffusedisolating layer 16 reaching the n-buried isolating layer 15 is formed inthe second region S2 of the n⁻ semiconductor layer 2 e.

Then, the p-well region 17, n-source region 18, n-drain region 19, gateoxide film 20, gate electrode 21, source electrode (not shown), drainelectrode (not shown), and the like, of the lateral MOSFET 172 areformed in a region of the n⁻ semiconductor layer 2 bounded by then-buried isolating layer 15 and n-diffused isolating layer 16. That is,the planar gate structure of the lateral MOSFET 172 is formed (FIG. 29(d)). Next, by the drain electrode 13 being formed on the rear surface ofthe n⁺ semiconductor layer 1, the semiconductor device 170 shown in FIG.8 is completed.

As heretofore described, according to Embodiment 19, it is possible toobtain the same advantages as with the semiconductor devicemanufacturing method according to Embodiment 13.

Embodiment 20

FIG. 30 is a sectional view showing a semiconductor device manufacturingmethod according to Embodiment 20 of the invention. In Embodiment 20, adescription will be given of a method of manufacturing the semiconductordevice 210 according to Embodiment 12 shown in FIG. 12.

Firstly, the semiconductor device manufacturing method according toEmbodiment 13 is carried out as far as the step of diffusing the n-typeimpurity and p-type impurity by heat treatment, thereby forming theparallel pn-layer 31 and n-buried isolating layer 15 (refer to FIG. 13(a) to FIG. 15( g)).

Next, continuing from the step of forming the parallel pn-layer 31 andn-buried isolating layer 15 (the step of FIG. 15( g)), a p-well region 5a of the vertical super junction MOSFET 211 is formed in a surface layerof the first region S1 of the n⁻ semiconductor layer 2 d, which is thetopmost layer of the n⁻ semiconductor layer 2. The p-well region 5 a isformed directly above the p-layer 4 so as to be in contact with thep-layer 4. Next, an n-source region 7 a is selectively formed in asurface layer of the p-well region 5 a.

Next, the trench 10 a reaching the n-layer 3 is formed in the firstregion S1 of the n⁻ semiconductor layer 2. Next, the gate electrode 10is embedded in the trench 10 a across the gate oxide film 9, therebyforming a trench gate structure. That is, the trench gate structure ofthe vertical super junction MOSFET 211 is formed. Next, the n-diffusedisolating layer 16 in contact with the n-buried isolating layer 15 isformed in the second region S2 of the n⁻ semiconductor layer 2.

Then, the p-well region 17, n-source region 18, n-drain region 19, gateoxide film 20, gate electrode 21, source electrode (not shown), drainelectrode (not shown), and the like, of the lateral MOSFET 212 areformed in a region of the n⁻ semiconductor layer 2 bounded by then-buried isolating layer 15 and n-diffused isolating layer 16. That is,the planar gate structure of the lateral MOSFET 212 is formed (FIG. 30).Next, by the drain electrode 13 being formed on the rear surface of then⁺ semiconductor layer 1, the semiconductor device 210 shown in FIG. 12is completed.

As heretofore described, according to Embodiment 20, it is possible toobtain the same advantages as with the semiconductor devicemanufacturing method according to Embodiment 13.

In each of the heretofore described embodiments, the edge terminationstructure of the vertical super junction MOSFET is formed on the outerside of the first region S1 of the n⁻ semiconductor layer 2 so as tosurround the first region S1. Heretofore known technology can be used asappropriate for the configuration of the edge termination structure andthe method of manufacturing the edge termination structure.

With the semiconductor devices 100 to 210 according to Embodiment 1 toEmbodiment 12, it is possible to realize an intelligent super junctionsemiconductor element wherein a vertical super junction element and acontrol integrated circuit are integrated on the same semiconductorsubstrate.

Heretofore, a description of the invention has been given using as anexample a semiconductor device wherein one lateral MOSFET is formed on asemiconductor substrate on which a vertical super junction MOSFET isformed but, not being limited to the heretofore described embodiments,the invention can also be applied to a semiconductor device wherein avertical super junction MOSFET and a plurality of lateral MOSFETs areformed on the same semiconductor substrate.

INDUSTRIAL APPLICABILITY

As heretofore described, the semiconductor device and manufacturingmethod thereof according to the invention are useful in a semiconductordevice wherein a lateral semiconductor element and a super junctionvertical semiconductor element are formed on the same substrate.

Thus, a semiconductor device and method manufacturing have beendescribed according to the present invention. Many modifications andvariations may be made to the techniques and structures described andillustrated herein without departing from the spirit and scope of theinvention. Accordingly, it should be understood that the devices andmethods described herein are illustrative only and are not limiting uponthe scope of the invention.

REFERENCE NUMBER LIST

-   1 n⁺ semiconductor layer-   2, 2 a, 2 b, 2 c, 2 d, 2 e n⁻ semiconductor layer-   2 f, 2 g Main surface-   3, 26 n-layer-   3 a, 3 b, 3 c, 3 d, 15 a, 15 b, 26 a n-type ion implantation layer-   4 p-layer-   4 a, 4 b, 4 c, 4 d p-type ion implantation layer-   5, 5 a, 17 p-well region-   6 n-drift region-   7, 7 a, 18 n-source region-   8 p-contact region-   9, 10 b, 20 Gate oxide film-   10, 21 Gate electrode-   10 a, 27 a Trench-   11 Inter layer dielectric-   12, 22 Source electrode-   13, 23 Drain electrode-   15, 28 n-buried isolating layer-   16, 16 a n-diffused isolating layer-   18 a p-source region-   19 a p-drain region-   19 n-drain region-   24 p-buried isolating layer-   25 p-diffused isolating layer-   27 Trench isolating structure-   27 a Trench-   31 Parallel pn-layer-   40 Vertical direction with respect to main surface-   41 Horizontal direction with respect to main surface-   53 a, 53 b, 53 c, 53 d n-type impurity ion implantation-   54 a, 54 b, 54 c, 54 d p-type impurity ion implantation-   100, 110, 120, 130, 140, 150, 160, 170, 180, 190, 200, 210    Semiconductor device-   101, 111, 121, 131, 141, 151, 161, 171, 181, 191, 201, 211 Vertical    super junction MOSFET-   102, 112, 122, 132, 142, 152, 162, 172, 182, 192, 202, 212 Lateral    MOSFET-   S1 First region-   S2 Second region

1-7. (canceled)
 8. A method of manufacturing a semiconductor devicehaving a first region in which a vertical semiconductor element isdisposed and a second region in which a lateral semiconductor elementelectrically isolated from the vertical semiconductor element by anisolating structure is disposed, the semiconductor device manufacturingmethod comprising: a first step of forming by epitaxial growth on afirst conductivity type first semiconductor layer a first conductivitytype first epitaxial layer with an impurity concentration lower thanthat of the first semiconductor layer; a second step of selectivelycarrying out a first ion implantation of a first conductivity typeimpurity into a first region of the first epitaxial layer; a third stepof selectively carrying out a second ion implantation of a secondconductivity type impurity into a region of the first epitaxial layersandwiched by regions of the first ion implantation; a fourth step,after the third step, of forming by epitaxial growth on the firstepitaxial layer a first conductivity type second epitaxial layer havingan impurity concentration the same as that of the first epitaxial layer;a fifth step of carrying out a third ion implantation of a firstconductivity type impurity into a region of the second epitaxial layerdirectly above a place of the first ion implantation and into a secondregion distanced from the region directly above the place of the firstion implantation; a sixth step, after the fifth step, of carrying out afourth ion implantation of a second conductivity type impurity into aregion of the second epitaxial layer directly above a place of thesecond ion implantation; a seventh step, after the sixth step, offorming by epitaxial growth on the second epitaxial layer a firstconductivity type third epitaxial layer having an impurity concentrationthe same as that of the second epitaxial layer; and an eighth step ofdiffusing by heat treatment the first conductivity type impurity andsecond conductivity type impurity ion implanted into the first epitaxiallayer and second epitaxial layer, thereby forming a parallel pn-layerformed by the first conductivity type third semiconductor layer andsecond conductivity type fourth semiconductor layer connected from thefirst epitaxial layer to the third epitaxial layer being alternatelydisposed, and forming a fifth semiconductor layer connected across thesecond region of the second epitaxial layer and third epitaxial layer,thereby configuring an isolating structure.
 9. A method of manufacturinga semiconductor device having a first region in which a verticalsemiconductor element is disposed and a second region in which a lateralsemiconductor element electrically isolated from the verticalsemiconductor element by an isolating structure is disposed, thesemiconductor device manufacturing method comprising: a first step offorming by epitaxial growth on a first semiconductor layer a firstconductivity type first epitaxial layer with an impurity concentrationlower than that of the first semiconductor layer; a second step ofcarrying out a first ion implantation of a first conductivity typeimpurity throughout the whole of a first region of the first epitaxiallayer; a third step of selectively carrying out a second ionimplantation of a second conductivity type impurity into the firstregion of the first epitaxial layer into which the first ionimplantation has been carried out; a fourth step, after the third step,of forming by epitaxial growth on the first epitaxial layer a firstconductivity type second epitaxial layer having an impurityconcentration the same as that of the first epitaxial layer; a fifthstep of carrying out a third ion implantation of a first conductivitytype impurity into a region of the second epitaxial layer directly abovea place of the first ion implantation; a sixth step, after the fifthstep, of selectively carrying out a fourth ion implantation of a secondconductivity type impurity into a region of the second epitaxial layerdirectly above a place of the second ion implantation and into a secondregion distanced from the region directly above the place of the firstion implantation; a seventh step, after the sixth step, of forming byepitaxial growth on the second epitaxial layer a first conductivity typethird epitaxial layer having an impurity concentration the same as thatof the second epitaxial layer; and an eighth step of diffusing by heattreatment the first conductivity type impurity and second conductivitytype impurity ion implanted into the first epitaxial layer and secondepitaxial layer, thereby forming a parallel pn-layer formed by the firstconductivity type third semiconductor layer and second conductivity typefourth semiconductor layer connected from the first epitaxial layer tothe third epitaxial layer being alternately disposed, and forming afifth semiconductor layer connected across the second region of thesecond epitaxial layer and third epitaxial layer, thereby configuring anisolating structure.
 10. A method of manufacturing a semiconductordevice having a first region in which a vertical semiconductor elementis disposed and a second region in which a lateral semiconductor elementelectrically isolated from the vertical semiconductor element by anisolating structure is disposed, the semiconductor device manufacturingmethod comprising: a first step of forming by epitaxial growth on afirst conductivity type first semiconductor layer a first conductivitytype first epitaxial layer with an impurity concentration lower thanthat of the first semiconductor layer; a second step of selectivelycarrying out a first ion implantation of a first conductivity typeimpurity into a first region of the first epitaxial layer; a third stepof selectively carrying out a second ion implantation of a secondconductivity type impurity into a region of the first epitaxial layersandwiched by places of the first ion implantation; a fourth step, afterthe third step, of forming by epitaxial growth on the first epitaxiallayer a first conductivity type second epitaxial layer having animpurity concentration the same as that of the first epitaxial layer; afifth step of carrying out a third ion implantation of a firstconductivity type impurity into a region of the second epitaxial layerdirectly above a place of the first ion implantation; a sixth step,after the fifth step, of selectively carrying out a fourth ionimplantation of a second conductivity type impurity into a region of thesecond epitaxial layer directly above a place of the second ionimplantation and into a second region distanced from the region directlyabove the place of the first ion implantation; a seventh step, after thesixth step, of forming by epitaxial growth on the second epitaxial layera first conductivity type third epitaxial layer having an impurityconcentration the same as that of the second epitaxial layer; and aneighth step of diffusing by heat treatment the first conductivity typeimpurity and second conductivity type impurity ion implanted into thefirst epitaxial layer and second epitaxial layer, thereby forming aparallel pn-layer formed by the first conductivity type thirdsemiconductor layer and second conductivity type fourth semiconductorlayer connected from the first epitaxial layer to the third epitaxiallayer being alternately disposed, and forming a fifth semiconductorlayer connected across the second region of the second epitaxial layerand third epitaxial layer, thereby configuring an isolating structure.11. A method of manufacturing a semiconductor device having a firstregion in which a vertical semiconductor element is disposed and asecond region in which a lateral semiconductor element electricallyisolated from the vertical semiconductor element by an isolatingstructure is disposed, the semiconductor device manufacturing methodcomprising: a first step of forming by epitaxial growth on a firstconductivity type first semiconductor layer a first conductivity typefirst epitaxial layer with an impurity concentration lower than that ofthe first semiconductor layer; a second step of carrying out a first ionimplantation of a first conductivity type impurity throughout the wholeof the first epitaxial layer; a third step of selectively carrying out asecond ion implantation of a second conductivity type impurity into afirst region of the first epitaxial layer into which the first ionimplantation has been carried out; a fourth step, after the third step,of forming by epitaxial growth on the first epitaxial layer a firstconductivity type second epitaxial layer having an impurityconcentration the same as that of the first epitaxial layer; a fifthstep of carrying out a third ion implantation of a first conductivitytype impurity throughout the whole of the second epitaxial layer; asixth step, after the fifth step, of carrying out a fourth ionimplantation of a second conductivity type impurity into a region of thesecond epitaxial layer directly above a place of the second ionimplantation; a seventh step, after the sixth step, of forming byepitaxial growth on the second epitaxial layer a first conductivity typethird epitaxial layer having an impurity concentration the same as thatof the second epitaxial layer; and an eighth step of diffusing by heattreatment the first conductivity type impurity and second conductivitytype impurity ion implanted into the first epitaxial layer and secondepitaxial layer, thereby forming a parallel pn-layer formed by the firstconductivity type third semiconductor layer and second conductivity typefourth semiconductor layer connected from the first epitaxial layer tothe third epitaxial layer being alternately disposed, and forming afifth semiconductor layer connected from the first semiconductor layerto the third epitaxial layer, thereby configuring an isolatingstructure. 12-18. (canceled)